Waveguide-Coupled Disk Resonators on a Crack-Free Si3N4 Film with a Dense Stress Release Pattern

被引：0

作者：

Wu, Kaiyi ^{[1
]}

Poon, Andrew W. ^{[1
]}

机构：

[1] Hong Kong Univ Sci & Technol, Photon Device Lab, Dept Elect & Comp Engn, Kowloon, Clear Water Bay, Hong Kong, Peoples R China

来源：

2019 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2019年

关键词：

D O I：

暂无

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We deposit a crack-free 780nm-thick Si3N4 film on a dense stress release pattern on a 100mm silicon wafer. Our fabricated waveguide-coupled 920 mu m-radius Si3N4 disk resonator reveals a high loaded quality factor of 1.7x10(6). (C) 2019 The Author(s)

引用

页数：2

共 42 条

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