Waveguide-Coupled Disk Resonators on a Crack-Free Si3N4 Film with a Dense Stress Release Pattern

被引：0
|
作者：
Wu, Kaiyi [1 ]
Poon, Andrew W. [1 ]
机构：
[1] Hong Kong Univ Sci & Technol, Photon Device Lab, Dept Elect & Comp Engn, Kowloon, Clear Water Bay, Hong Kong, Peoples R China
来源：
2019 CONFERENCE ON LASERS AND ELECTRO-OPTICS (CLEO) | 2019年
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中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
We deposit a crack-free 780nm-thick Si3N4 film on a dense stress release pattern on a 100mm silicon wafer. Our fabricated waveguide-coupled 920 mu m-radius Si3N4 disk resonator reveals a high loaded quality factor of 1.7x10(6). (C) 2019 The Author(s)
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页数：2
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