Layered synthetic microstructures: Importance of a combined X-ray standing wave and X-ray reflectivity analysis

被引:2
|
作者
Dev, BN [1 ]
机构
[1] Inst Phys, Bhubaneswar 751005, Orissa, India
关键词
D O I
10.1142/9789812704221_0011
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Layered synthetic microstructures consisting of thin layers of alternating elements or compounds have unique structural, electronic and magnetic properties with a wide range of applications. For such multilayer systems it is important to correlate the measured proper-ties with structure and composition so that preparation techniques can be optimized to yield high performance materials. For magnetic multilayers where alternating layers are magnetic and nonmagnetic materials, a small amount (even a few percent) of magnetic impurity (either from the magnetic layers or external) in the nonmagnetic layer can change the magnetic coupling and magnetoresistance significantly. Determination of such small concentrations by X-ray reflectrometry is often very difficult. Layer composition is more accurately determined by X-ray standing wave (XSW) analysis, while interface roughness is more accurately determined by the X-ray reflectivity (XRR) technique. It is shown that for periodic multilayers, a combined XSW and XRR analysis provides more accurate compositional and microstructural information overcoming the deficiencies of the individual techniques.
引用
收藏
页码:109 / 120
页数:12
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