Use of layered synthetic microstructures for the quantitative x-ray analysis of light elements

被引:0
|
作者
Hombourger, C
Jonnard, P
André, JM
Chauvineau, JP
机构
[1] Univ Paris 06, Lab Chim Phys Mat & Rayonnement, UMR 7614, F-75231 Paris 05, France
[2] Inst Opt Theor & Appl, URA 14, Ctr Univ Orsay, F-91403 Orsay, France
关键词
D O I
10.1002/(SICI)1097-4539(199905/06)28:3<163::AID-XRS331>3.3.CO;2-Q
中图分类号
O433 [光谱学];
学科分类号
0703 ; 070302 ;
摘要
Measurements of long-wavelength x-rays emitted by light elements can be achieved by using selected layered synthetic microstructures (LSM). For both C K alpha and N K alpha radiation, W/Si (d = 3.25 nm) LSM was used. Because of the counter efficiency, the C K alpha emission has the highest intensity in spite of a calculated reflectivity of the W/Si LSM in favor of the N K alpha emission. For B K alpha radiation, Mo/Si (d = 5.0 nm), B/Si (d = 4.6 nm) and Ni/C (d = 4.8 nm) LSM were used. Ni/C LSM is the best LSM for the B K alpha range because in B/Si LSM the presence of boron gives rise to the anomalous diffusion phenomenon. The intensity, peak-to-background ratio and experimental resolution are better for Ni/C than for Mo/Si LSM. Copyright (C) 1999 John Wiley & Sons, Ltd.
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页码:163 / 167
页数:5
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