Use of layered synthetic microstructures for the quantitative x-ray analysis of light elements

Measurements of long-wavelength x-rays emitted by light elements can be achieved by using selected layered synthetic microstructures (LSM). For both C K alpha and N K alpha radiation, W/Si (d = 3.25 nm) LSM was used. Because of the counter efficiency, the C K alpha emission has the highest intensity in spite of a calculated reflectivity of the W/Si LSM in favor of the N K alpha emission. For B K alpha radiation, Mo/Si (d = 5.0 nm), B/Si (d = 4.6 nm) and Ni/C (d = 4.8 nm) LSM were used. Ni/C LSM is the best LSM for the B K alpha range because in B/Si LSM the presence of boron gives rise to the anomalous diffusion phenomenon. The intensity, peak-to-background ratio and experimental resolution are better for Ni/C than for Mo/Si LSM. Copyright (C) 1999 John Wiley & Sons, Ltd.