Characterization of nanoporous low dielectric constant thin films.

被引:0
|
作者
Huang, QR [1 ]
Frank, CW [1 ]
Mecerreyes, D [1 ]
Miller, RD [1 ]
机构
[1] Stanford Univ, Dept Chem Engn, Stanford, CA 94305 USA
关键词
D O I
暂无
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
436-PMSE
引用
收藏
页码:U424 / U424
页数:1
相关论文
共 50 条
  • [21] Nanoporous structure of low-dielectric-constant films: A process compatibility study
    Wang, CL
    Weber, MH
    Lynn, KG
    JOURNAL OF APPLIED PHYSICS, 2006, 99 (11)
  • [22] Nanoporous structure of low-dielectric-constant films: A process compatibility study
    Wang, C.L.
    Weber, M.H.
    Lynn, K.G.
    Journal of Applied Physics, 2006, 99 (11):
  • [23] Dielectric Constant of Porous Ultra Low-κ Thin Films
    Jousseaume, V.
    Gourhant, O.
    Gonon, P.
    Zenasni, A.
    Favennec, L.
    JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2012, 159 (05) : G49 - G55
  • [24] Improvement of microstructure property of low dielectric constant nanoporous SiOF thin films prepared by sol-gel method
    He, Z. W.
    Xu, D. Y.
    Jiang, X. H.
    Wang, Y. Y.
    MICROPOROUS AND MESOPOROUS MATERIALS, 2008, 111 (1-3) : 206 - 210
  • [25] Modeling to Predict Effective Dielectric Constant of Porous Silicon Low-Dielectric-constant Thin Films
    Rahmoun, K.
    Fakiri, S.
    SPECTROSCOPY LETTERS, 2014, 47 (05) : 348 - 355
  • [26] A theoretical model on pore size distribution in low dielectric constant nanoporous silica films
    Hsu, JP
    Hung, SH
    Chen, WC
    THIN SOLID FILMS, 2005, 473 (02) : 185 - 190
  • [27] Optical characterization of organic thin films.
    Swalen, JD
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1997, 214 : 139 - ANYL
  • [28] Fluorinated nanoporous SiO2 films with ultra-low dielectric constant
    Zhen, C. M.
    Zhang, J. J.
    Zhang, Y. J.
    Liu, C. X.
    Pan, C. F.
    Hou, D. L.
    JOURNAL OF NON-CRYSTALLINE SOLIDS, 2008, 354 (32) : 3867 - 3870
  • [29] Synthesis and characterization of porous polymeric low dielectric constant films
    Yuhuan Xu
    D. W. Zheng
    Yipin Tsai
    K. N. Tu
    Bin Zhao
    Q. Z. Liu
    Maureen Brongo
    Chung Wo Ong
    Chung Loong Choy
    George T. T. Sheng
    C. H. Tung
    Journal of Electronic Materials, 2001, 30 : 309 - 313
  • [30] Characterization of boron carbon nitride films with a low dielectric constant
    Etou, Y
    Tai, T
    Sugiyama, T
    Sugino, T
    DIAMOND AND RELATED MATERIALS, 2002, 11 (3-6) : 985 - 988