Performance evaluation of tunnel junction-based N-polar AlGaN deep-ultraviolet light-emitting diodes

被引:9
|
作者
Xiao, Shudan [1 ]
Yu, Huabin [1 ]
Jia, Hongfeng [1 ]
Memon, Muhammad Hunain [1 ]
Wang, Rui [1 ]
Zhang, Haochen [1 ]
Sun, Haiding [1 ]
机构
[1] Univ Sci & Technol China, Sch Microelect, Hefei 230026, Anhui, Peoples R China
基金
中国国家自然科学基金;
关键词
Aluminum alloys - Aluminum gallium nitride - Gallium nitride - Hole concentration - III-V semiconductors - Light emitting diodes - Semiconductor alloys;
D O I
10.1364/OL.467685
中图分类号
O43 [光学];
学科分类号
070207 ; 0803 ;
摘要
In this study, an N-polar AlGaN-based deep-ultraviolet (DUV) light-emitting diode (LED) incorporating a tunnel junction (TJ) as the p-side contact layer, named the N-TJ-LED, was proposed. Compared with regular N-polar LEDs (N-LEDs) with a p-GaN contact layer, the N-TJ-LEDs exhibited 50% enhanced internal quantum efficiency, 2.7 times higher light output power at an injection current of 40 mA, and dramatically reduced turn-on voltage. In addition, it was found that the N-TJ-LED can still maintain outstanding device performance at a low p-type doping level in the electron blocking layer and p-AlGaN current injection layer, significantly outperforming the regular N-LED. All these performance enhancements are derived from the higher electron and hole concentration in the active region of the N-TJ-LED, thanks to the TJ-facilitated efficient hole injection and effective electron blocking in the device. The results demonstrated in this work provide an effective strategy for the future experimental optimization of N-polar AlGaN-based DUV LEDs. (C) 2022 Optica Publishing Group
引用
收藏
页码:4187 / 4190
页数:4
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