Aluminum nitride deep-ultraviolet light-emitting p-n junction diodes

被引:39
|
作者
Taniyasu, Yoshitaka [1 ]
Kasu, Makoto [1 ]
机构
[1] NTT Corp, NTT Basic Res Labs, Atsugi, Kanagawa 2430198, Japan
关键词
AlN; MOVPE; doping; LED;
D O I
10.1016/j.diamond.2008.02.042
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
This paper reviews our work on aluminum nitride (AlN) p-n junction light-emitting diodes (LEDs). N-type AlN was obtained by Si doping, By reducing dislocation density in n-type Si-doped AlN, we achieved a room-temperature electron mobility of 426 cm(2) V-1 s(-1). We analyzed the temperature dependence of the electron mobility and how the electron mobility is limited by specific scattering mechanisms. p-type AlN was obtained by Mg doping and its acceptor ionization energy was estimated to be 630 meV. We fabricated AlN p-n junction LEDs and observed electroluminescence (EL) with a wavelength of approximately 210 nm, the shortest wavelength ever observed among semiconductors. The EL was assigned to the near-band-edge emission of AlN. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:1273 / 1277
页数:5
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