Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film

被引:11
|
作者
Komlev, A. E. [1 ]
Shapovalov, V. I. [1 ]
Shutova, N. S. [1 ]
机构
[1] St Petersburg State Electrotech Univ LETI, St Petersburg 197238, Russia
关键词
GAS-DISCHARGE;
D O I
10.1134/S1063784212070122
中图分类号
O59 [应用物理学];
学科分类号
摘要
A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.
引用
收藏
页码:1030 / 1033
页数:4
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