MODELING OF THE ENERGY DEPOSITION MECHANISMS IN AN ARGON MAGNETRON PLANAR DISCHARGE

被引：36
|
作者：
GUIMARAES, F [1 ]
ALMEIDA, J [1 ]
BRETAGNE, J [1 ]
机构：
[1] UNIV PARIS 11,PHYS GAZ & PLASMAS LAB,CNRS,UA 0073,F-91405 ORSAY,FRANCE
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1991年 / 9卷 / 01期
关键词：
D O I：
10.1116/1.577113
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
The model for the planar magnetron discharge is based on the resolution of the Boltzmann equation for the electron energy distribution function corresponding to the plasma region of the discharge. It assumes that electron transport is controlled by binary collisions; effects of Coulomb collisions are included. The influence of the main discharge parameters (gas density, discharge current and voltage) is studied. Comparison of the (V(d)-I(d)) characteristics predicted by the model with experimental ones is made allowing some confidence in the model.
引用
收藏
页码：133 / 140
页数：8
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