Magnetron discharge in an argon-oxygen mixture for deposition of a titanium oxide film

被引：11

作者：

Komlev, A. E. ^{[1
]}

Shapovalov, V. I. ^{[1
]}

Shutova, N. S. ^{[1
]}

机构：

[1] St Petersburg State Electrotech Univ LETI, St Petersburg 197238, Russia

来源：

TECHNICAL PHYSICS | 2012年 / 57卷 / 07期

关键词：

GAS-DISCHARGE;

D O I：

10.1134/S1063784212070122

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A discharge in a planar magnetron with a titanium target is studied. It is found that a pressure rise from 2 to 6 mTorr in argon at a constant current increases the intensity of excited argon ion lines by almost 20%. The excitation of neutral titanium atoms is independent of the argon pressure: it depends on only the discharge current. The current-voltage characteristic of the magnetron in an argon-oxygen mixture completely reflects processes proceeding on the target of the magnetron.

引用

页码：1030 / 1033

页数：4

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