High power KrF excimer laser with a solid state switch for microlithography

被引：8

作者：

Mizoguchi, H ^{[1
]}

Ito, N ^{[1
]}

Nakarai, H ^{[1
]}

Kobayashi, Y ^{[1
]}

Itakura, Y ^{[1
]}

Komori, H ^{[1
]}

Wakabayashi, O ^{[1
]}

Aruga, T ^{[1
]}

Sakugawa, T ^{[1
]}

Koganezawa, T ^{[1
]}

机构：

[1] KOMATSU LTD,DIV RES,RES DEPT 2,HIRATSUKA,KANAGAWA 254,JAPAN

来源：

OPTICAL MICROLITHOGRAPHY IX | 1996年 / 2726卷

关键词：

KrF; excimer laser; solid state switch; deep-UV; CoO;

D O I：

10.1117/12.240945

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：831 / 840

页数：10

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