High power KrF excimer laser with a solid state switch for microlithography

被引：8

作者：

Mizoguchi, H ^{[1
]}

Ito, N ^{[1
]}

Nakarai, H ^{[1
]}

Kobayashi, Y ^{[1
]}

Itakura, Y ^{[1
]}

Komori, H ^{[1
]}

Wakabayashi, O ^{[1
]}

Aruga, T ^{[1
]}

Sakugawa, T ^{[1
]}

Koganezawa, T ^{[1
]}

机构：

[1] KOMATSU LTD,DIV RES,RES DEPT 2,HIRATSUKA,KANAGAWA 254,JAPAN

来源：

OPTICAL MICROLITHOGRAPHY IX | 1996年 / 2726卷

关键词：

KrF; excimer laser; solid state switch; deep-UV; CoO;

D O I：

10.1117/12.240945

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

引用

页码：831 / 840

页数：10

共 50 条

[21] Gigaphoton tests KrF excimer laser
不详
PHOTONICS SPECTRA, 2017, 51 (02) : 16 - 16
[22] HIGH REPETITION RATE KRF LASER PLASMA X-RAY SOURCE FOR MICROLITHOGRAPHY
BIJKERK, F
LOUIS, E
TURCU, ECI
TALLENTS, GJ
MICROELECTRONIC ENGINEERING, 1992, 17 (1-4) : 219 - 222
[23] HIGH-EFFICIENCY HIGH REPETITION-RATE KRF EXCIMER LASER
HOTTA, K
ARAI, M
ITO, S
NEC RESEARCH & DEVELOPMENT, 1989, (93): : 1 - 10
[24] High fluence KrF excimer laser fabricated Bragg grating in a microfiber
Lin, Bo
Tjin, Swee Chuan
Wang, Guanghui
Shum, Ping
INTERNATIONAL CONFERENCE ON OPTICS IN PRECISION ENGINEERING AND NANOTECHNOLOGY (ICOPEN 2011), 2011, 19
[25] A Quenched Dye Laser Pumped by a KrF Excimer Laser
XUE Shaolin
LOU Qihong
HUANG Huijie
DU Longlong (Shanghai Institute of Optics and Fine Mechanics
ChineseJournalofLasers, 1996, (06) : 481 - 484
[26] KRYPTON FLUORIDE EXCIMER-LASER FOR ADVANCED MICROLITHOGRAPHY
SENGUPTA, UK
OPTICAL ENGINEERING, 1993, 32 (10) : 2410 - 2420
[27] Present and future trends in excimer laser based microlithography
Tittel, FK
Erdelyi, M
Horvath, ZL
Kroyan, A
Wilson, W
Smayling, M
Bor, Z
Szabo, G
ATOMIC AND MOLECULAR PULSED LASERS II, 1998, 3403 : 248 - 253
[28] Micro turning of graphite with KrF excimer laser
Kubota, S
Uno, Y
Yokomizo, S
PRECISION ENGINEERING, NANOTECHNOLOGY, VOL. 2, 1999, : 56 - 59
[29] QUARTER MICRON KRF EXCIMER LASER LITHOGRAPHY
SASAGO, M
ENDO, M
TANI, Y
KOBAYASHI, S
KOIZUMI, T
MATSUO, T
YAMASHITA, K
NOMURA, N
IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (04) : 582 - 587
[30] RECENT PROGRESS IN KRF EXCIMER LASER LITHOGRAPHY
NAKASE, M
IEICE TRANSACTIONS ON ELECTRONICS, 1993, E76C (01) : 26 - 31

← 1 2 3 4 5 →