High-average-power femtosecond KrF excimer laser

被引：8
|
作者：
Nabekawa, Y [1 ]
Yoshitomi, D
Sekikawa, T
Watanabe, S
机构：
[1] RIKEN, Inst Phys & Chem Res, Wako, Saitama 3510198, Japan
[2] Univ Tokyo, Inst Solid State Phys, Kashiwa, Chiba 2778581, Japan
来源：
IEEE JOURNAL OF SELECTED TOPICS IN QUANTUM ELECTRONICS | 2001年 / 7卷 / 04期
关键词：
excimer lasers; ultrafast lasers;
D O I：
10.1109/2944.974226
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
Development of high-peak and high-average-power ultrashort pulse KrF excimer lasers is described. Technical issues of KrF excimer as the amplifying medium for the ultrashort pulses are dramatically improved, resulting in a 50-W average power with a pulsewidth of 480 fs at 200-Hz repetition rate.
引用
收藏
页码：551 / 558
页数：8
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