Effect of temperature increase on performance of a multilayer Mo/Si interference mirror in the X-ray range

被引：2
|
作者：
André, JM
Barchewitz, R
Bridou, F
Pardo, B
Bac, S
Greiner, V
Troussel, P
机构：
[1] Univ Paris 06, Chim Phys Lab, Grp Opt X, CNRS,UA 176, F-75231 Paris 05, France
[2] Lab Utilisat Rayonnement Electromagnet, F-91405 Orsay, France
[3] Univ Paris Sud, Inst Opt Theor & Appliquee, CNRS, UA 14, F-91405 Orsay, France
[4] Ctr Etud Bruyeres Le Chatel, CEA,DAM, DRIF,DCRE, SDE, F-91680 Bruyeres Le Chatel, France
来源：
JOURNAL DE PHYSIQUE IV | 1998年 / 8卷 / P5期
关键词：
D O I：
10.1051/jp4:1998557
中图分类号：
O4 [物理学];
学科分类号：
0702 ;
摘要：
We studied the effect of an increase of temperature on the optical performances, in the X-ray range, of an interferential multilayer mirror Mo/Si. The multilayer stack made by magnetron sputtering was annealed at different temperatures between the room temperature and 500 degrees C. We observed a decrease of the period, a notable decrease of the "peak reflectivity" together with a broadening of the bandpass and a structural alteration. These effects are interpreted as the consequence of the formation of an interfacial layer cristallized in the form of hexagonal MoSi2.
引用
收藏
页码：453 / 457
页数：5
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