Modulation doped InGaAsP quantum well laser emitting at 1.55 μm

被引:2
|
作者
Choudhury, N [1 ]
Dutta, NK [1 ]
机构
[1] Univ Connecticut, Dept Phys, Storrs, CT 06269 USA
关键词
D O I
10.1063/1.1376403
中图分类号
O59 [应用物理学];
学科分类号
摘要
A number of parameters, such as gain, modulation response, linewidth enhancement factor and relative intensity noise, in a modulation-doped InGaAsP quantum well (QW) laser emitting at 1.55 mum have been theoretically investigated. The results indicate that the relaxation oscillation frequency for a p-type modulation doped QW laser is enhanced by a factor of more than 2 compared to that for undoped MQW lasers, the linewidth enhancement factor of a p-type modulation doped QW laser is reduced to 1/2 that of an undoped MQW laser and the relative intensity noise is reduced by a factor of > 10 dB compared to that for undoped MQW lasers. (C) 2001 American Institute of Physics.
引用
收藏
页码:38 / 42
页数:5
相关论文
共 50 条
  • [31] 1.55 μm InAsP/InGaAsP strained multiple-quantum-well laser diodes grown by solid-source molecular beam epitaxy
    Hao, Zhi-Biao
    Ren, Zai-Yuan
    He, Wei
    Luo, Yi
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (2 A): : 754 - 757
  • [32] Metamorphic growth of 1.55 μm InGaAs/InGaAsP multiple quantum wells laser structures on GaAs substrates
    李小波
    黄永清
    王俊
    段晓峰
    张瑞康
    李业弘
    刘正
    王琦
    张霞
    任晓敏
    ChineseOpticsLetters, 2015, 13 (03) : 36 - 40
  • [33] Metamorphic growth of 1.55 μm InGaAs/InGaAsP multiple quantum wells laser structures on GaAs substrates
    Li, Xiaobo
    Huang, Yongqing
    Wang, Jun
    Duan, Xiaofeng
    Zhang, Ruikang
    Li, Yehong
    Liu, Zheng
    Wang, Qi
    Zhang, Xia
    Ren, Xiaomin
    CHINESE OPTICS LETTERS, 2015, 13 (03)
  • [34] 1.55 μm InAsP/InGaAsP strained multiple-quantum-well laser diodes grown by solid-source molecular beam epitaxy
    Hao, ZB
    Ren, ZY
    He, W
    Luo, Y
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2002, 41 (2A): : 754 - 757
  • [35] THE GROWTH OF INGAASP BY CBE FOR SCH QUANTUM-WELL LASERS OPERATING AT 1.55 AND 1.4 MU-M
    SHERWIN, ME
    MUNNS, GO
    NICHOLS, DT
    BHATTACHARYA, PK
    TERRY, FL
    JOURNAL OF CRYSTAL GROWTH, 1992, 120 (1-4) : 162 - 166
  • [36] 1.55 μm InP-InGaAsP quantum-well lasers fabricated on Si substrates by wafer bonding
    State Key Laboratory of Integrated Optoelectronics, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
    Pan Tao Ti Hsueh Pao, 2006, 4 (741-743):
  • [37] Wide operating temperature range of passively mode locked InGaAs/InGaAsP 1.55 μm quantum well lasers
    Tan, WK
    Wong, HY
    Lee, HK
    Bryce, AC
    Marsh, JH
    2003 IEEE LEOS ANNUAL MEETING CONFERENCE PROCEEDINGS, VOLS 1 AND 2, 2003, : 824 - 825
  • [38] High temperature characteristics of 1.55 μm InGaAs/InGaAsP strain-compensated multiple quantum well lasers
    Ma, CS
    Guo, WB
    Liu, SY
    SEMICONDUCTOR OPTOELECTRONIC DEVICE MANUFACTURING AND APPLICATIONS, 2001, 4602 : 173 - 177
  • [39] Rabi oscillations of ultrashort pulses in 1.55-μm InGaAs/InGaAsP quantum-well optical amplifiers
    Zhang, JZ
    Galbraith, I
    Physics of Semiconductors, Pts A and B, 2005, 772 : 1236 - 1237
  • [40] Intersubband absorption at λ∼1.55 μm in well- and modulation-doped GaN/AlGaN multiple quantum wells with superlattice barriers
    Gmachl, C
    Ng, HM
    Chu, SNG
    Cho, AY
    APPLIED PHYSICS LETTERS, 2000, 77 (23) : 3722 - 3724