Compact Modeling of I-V Characteristics in Irradiated MOSFETs: Impact of Operation Temperature and Interface Traps

被引:0
|
作者
Orlov, V. V. [1 ]
Felitsyn, V. A. [1 ]
Zebrev, G. I. [1 ]
机构
[1] Natl Res Nucl Univ MEPHI, Dept Micro & Nanoelect, Moscow, Russia
关键词
compact modeling; MOSFET; ionizing radiation; LEAKAGE;
D O I
暂无
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have presented a new compact MOSFET model, which allows us to describe the I-V characteristics of heavily irradiated long-channel and short-channel transistors in all operation modes at different measurement temperatures and interface trap densities.
引用
收藏
页数:4
相关论文
共 50 条
  • [31] A unified I-V model for PD/FD SOI MOSFETs with a compact model for floating body effects
    Bolouki, S
    Maddah, M
    Afzali-Kusha, A
    El Nokali, M
    SOLID-STATE ELECTRONICS, 2003, 47 (11) : 1909 - 1915
  • [32] I-V characteristics of polycrystalline silicon diodes and the energy distribution of traps in grain boundaries
    Yamamoto, Ichiro
    Takeda, Ryo
    Suzuki, Yoshihisa
    Kuwano, Hiroshi
    Saito, Yoji
    Electronics and Communications in Japan, Part II: Electronics (English translation of Denshi Tsushin Gakkai Ronbunshi), 1992, 75 (07): : 51 - 59
  • [33] Fully Analytical Compact Model for the I-V Characteristics of Resonant Tunneling Diodes
    Celino, Daniel R.
    de Souza, Adelcio M.
    Plazas, Caio L. M. P.
    Ragi, Regiane
    Romero, Murilo A.
    35TH SYMPOSIUM ON MICROELECTRONICS TECHNOLOGY AND DEVICES (SBMICRO2021), 2021,
  • [34] A compact model for the I-V characteristics of an undoped double-gate MOSFET
    Morris, Hedley C.
    Limon, Alfonso
    MATHEMATICS AND COMPUTERS IN SIMULATION, 2008, 79 (04) : 1116 - 1125
  • [35] High-Temperature Empirical Modeling for the I-V Characteristics of GaN150-Based HEMT
    Amer, Mostafa
    Hassan, Ahmad
    Ragab, Ahmed
    Yacout, Soumaya
    Savaria, Yvon
    Sawan, Mohamad
    2018 IEEE INTERNATIONAL SYMPOSIUM ON CIRCUITS AND SYSTEMS (ISCAS), 2018,
  • [36] Effects of Unintended Dopants on I-V Characteristics of the Double-Gate MOSFETs, a Simulation Study
    Li Pei-Cheng
    Mei Guang-Hui
    Hu Guang-Xi
    Wang Ling-Li
    Liu Ran
    Tang Ting-Ao
    COMMUNICATIONS IN THEORETICAL PHYSICS, 2012, 58 (01) : 171 - 174
  • [37] Effects of Unintended Dopants on I-V Characteristics of the Double-Gate MOSFETs,a Simulation Study
    李佩成
    梅光辉
    胡光喜
    王伶俐
    刘冉
    汤庭鳌
    Communications in Theoretical Physics, 2012, 58 (07) : 171 - 174
  • [38] Prediction of I-V characteristics of double-gate SOI MOSFETs with ultrathin semiconductor layer
    Janik, T.
    Majkusiak, B.
    Jakubowski, A.
    2000, Inst Electron Technol, Warszawa, Poland (33):
  • [39] Modeling of the nMOSFET I-V characteristics in relation with defects induced by the stress
    Bouhdada, A.
    Marrach, R.
    Modelling, Measurement and Control A, 2002, 75 (3-4): : 21 - 31
  • [40] Statistically modeling I-V characteristics of CNT-FET with LASSO
    Dongsheng Ma
    Zuochang Ye
    Yan Wang
    Journal of Semiconductors, 2017, (08) : 32 - 35