Preparation of two-dimensional thin films by backside irradiation pulsed laser deposition method using powder target

被引:4
|
作者
Kawasaki, Hiroharu [1 ]
Ohshima, Tamiko [1 ]
Yagyu, Yoshihito [1 ]
Ihara, Takeshi [1 ]
Shinohara, Masanori [1 ]
Suda, Yoshiaki [2 ]
机构
[1] Sasebo Coll, Natl Inst Technol, Nagasaki 8571193, Japan
[2] Ishikawa Coll, Natl Inst Technol, Tsubata, Ishikawa 9290392, Japan
关键词
D O I
10.7567/1347-4065/ab4e76
中图分类号
O59 [应用物理学];
学科分类号
摘要
In this work, two-dimensional thin films were prepared by pulsed laser deposition (PLD) via backside irradiation. For this, a handmade transparent target holder made of quartz-glass was used to hold the powder targets. Visible-wavelength pulsed laser irradiation was applied from the holder side to the substrate. Using this new method, indium (In) and zinc (Zn)-concentrated thin films were prepared on a silicon substrate. The deposition rate of the film prepared with this method was calculated from the thickest position of the prepared film and the deposition time. The deposition rate was lower than for films prepared via conventional PLD. Two-dimensional profiles of the prepared films via backside irradiation PLD displayed a convex shape and its spatial resolution strongly depended on the laser profile. X-ray photoelectron spectroscopy measurements suggested that tailored In and Zn composition thin films could be prepared with this method using an In2O3 and ZnO powder target. (c) 2019 The Japan Society of Applied Physics
引用
收藏
页数:5
相关论文
共 50 条
  • [21] Preparation of Cr(Nx,Oy) thin films by pulsed laser deposition
    Suzuki, T
    Saito, H
    Hirai, M
    Suematsu, H
    Jiang, WH
    Yatsui, K
    THIN SOLID FILMS, 2002, 407 (1-2) : 118 - 121
  • [22] Preparation of ZnO thin films on various substrates by pulsed laser deposition
    Ohshima, T
    Thareja, RK
    Ikegami, T
    Ebihara, K
    SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 517 - 520
  • [23] Preparation and characterization of mordenite thin films via pulsed laser deposition
    Pisklak, TJ
    Balkus, KJ
    JOURNAL OF POROUS MATERIALS, 2004, 11 (04) : 191 - 209
  • [24] Preparation of IrO2 thin films by pulsed laser deposition
    Xia Mingxiang
    Wang Chuanbin
    Gong Yansheng
    Shen Qiang
    Zhang Liamneng
    RARE METAL MATERIALS AND ENGINEERING, 2006, 35 (05) : 820 - 823
  • [25] Preparation and characterization of tin oxide thin films by pulsed laser deposition
    Ponce, L
    Jimenez, E
    Leon, R
    Garcia, T
    Pena, JL
    BartoloPerez, P
    Machorro, R
    Siqueiros, J
    CotaAraiza, L
    Farias, MH
    SURFACES, VACUUM, AND THEIR APPLICATIONS, 1996, (378): : 165 - 168
  • [26] Preparation of IrO2 thin films by pulsed laser deposition
    Xia, Mingxiang
    Wang, Chuanbin
    Gong, Yansheng
    Shen, Qiang
    Zhang, Lianmeng
    Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2006, 35 (05): : 820 - 823
  • [27] Preparation of crystalline TiC thin films grown by pulsed Nd:YAG laser deposition using Ti target in methane gas
    Suda, Y
    Kawasaki, H
    Doi, K
    Nanba, J
    Ohshima, T
    MATERIALS CHARACTERIZATION, 2002, 48 (2-3) : 221 - 228
  • [28] Pulsed laser deposition of ZnO thin films using a femtosecond laser
    Okoshi, M
    Higashikawa, K
    Hanabusa, M
    APPLIED SURFACE SCIENCE, 2000, 154 : 424 - 427
  • [29] Preparation of (001)-oriented PZT thin films on silicon wafers using pulsed laser deposition
    Zhao, J
    Lu, L
    Thompson, CV
    Lu, YF
    Song, WD
    JOURNAL OF CRYSTAL GROWTH, 2001, 225 (2-4) : 173 - 177
  • [30] Preparation of aluminum nitride films using pulsed laser deposition
    Fudan Univ., Shanghai 200433, China
    Zhongguo Jiguang/Chinese Journal of Lasers, 2001, 28 (03): : 272 - 274