Tactical advanced process control

被引：0

作者：

Dorough, M ^{[1
]}

Jensen, C ^{[1
]}

Do, D ^{[1
]}

Hansen, M ^{[1
]}

Standley, E ^{[1
]}

机构：

[1] Micron Technol, Boise, ID USA

来源：

2003 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, CONFERENCE PROCEEDINGS | 2003年

关键词：

D O I：

10.1109/ISSM.2003.1243301

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

To reduce implementation costs, maximize flexibility, and better manage intellectual property associated with Advanced Process Control (APC) systems, we present our experiences with tactical APC (TAPC) applications built upon established in-house tool automation, measurement collection, statistical process control (SPC), and process recipe management. TAPC includes process and software engineers, and a quality assurance statistician, focused on developing control algorithms capable of maintaining efficiency in process recipes.

引用

页码：358 / 361

页数：4

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