Advanced process control - Introduction

被引：0

作者：

IlesSmith, P

机构：

来源：

MEASUREMENT & CONTROL | 1996年 / 29卷 / 08期

关键词：

D O I：

10.1177/002029409602900801

中图分类号：

TP [自动化技术、计算机技术];

学科分类号：

0812 ;

摘要：

引用

页码：229 / 229

页数：1

共 50 条

[1] Introduction to the Special Section on Advanced Process Control
Moyne, James
Patel, Nital S.
IEEE TRANSACTIONS ON SEMICONDUCTOR MANUFACTURING, 2010, 23 (02) : 149 - 150
[2] Introduction to process control
Foundry Management & Technology, 1998, 126 (11):
[3] ADVANCED PROCESS CONTROL APPLICATIONS FOR ADVANCED CMP PROCESS
Yang, Jun
Lin, Yi Shih
Yang, SiYuan Frank
Huang, Yi
Shao, Qun
Liu, Hongtao
2015 China Semiconductor Technology International Conference, 2015,
[4] General advanced control: Introduction
Thompson, S
TRANSACTIONS OF THE INSTITUTE OF MEASUREMENT AND CONTROL, 1997, 19 (04) : 174 - 174
[5] Advanced process control
不详
POWER, 2000, 144 (05) : 39 - +
[6] Advanced process control: Benefits for photolithography process control
Gould, C
2002 IEEE/SEMI ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP: ADVANCING THE SCIENCE OF SEMICONDUCTOR MANUFACTURING EXCELLENCE, 2002, : 98 - 100
[7] Introduction of Next-Generation 3D AFM for Advanced Process Control
Foucher, J.
Therese, R.
Lee, Y.
Park, S. -, I
Cho, S. -J.
METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVII, 2013, 8681
[8] Advanced process control: Optimization or control
Kern, Allan
HYDROCARBON PROCESSING, 2010, 89 (12): : 15 - 15
[9] NDT and process control: An introduction
Shepard, SM
MATERIALS EVALUATION, 2005, 63 (07) : 735 - 735
[10] INTRODUCTION TO CHEMICAL PROCESS CONTROL
ARIS, R
AICHE JOURNAL, 1966, 12 (03) : 622 - &