Tactical advanced process control

被引：0
|
作者：
Dorough, M [1 ]
Jensen, C [1 ]
Do, D [1 ]
Hansen, M [1 ]
Standley, E [1 ]
机构：
[1] Micron Technol, Boise, ID USA
来源：
2003 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, CONFERENCE PROCEEDINGS | 2003年
关键词：
D O I：
10.1109/ISSM.2003.1243301
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
To reduce implementation costs, maximize flexibility, and better manage intellectual property associated with Advanced Process Control (APC) systems, we present our experiences with tactical APC (TAPC) applications built upon established in-house tool automation, measurement collection, statistical process control (SPC), and process recipe management. TAPC includes process and software engineers, and a quality assurance statistician, focused on developing control algorithms capable of maintaining efficiency in process recipes.
引用
收藏
页码：358 / 361
页数：4
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