Effect of annealing on adhesion of TiB2 films deposited by pulsed magnetron sputtering

被引：15
|
作者：
Arslan, E. [1 ]
Totik, Y. [2 ]
Celik, A. [2 ]
Efeoglu, I. [2 ]
机构：
[1] Ataturk Univ, Vocat Coll Erzurum, Erzurum, Turkey
[2] Ataturk Univ, Dept Mech Engn, Fac Engn, Erzurum, Turkey
来源：
SURFACE ENGINEERING | 2010年 / 26卷 / 08期
关键词：
Titanium diboride; Annealing; Adhesion; Magnetron sputtering; SCRATCH TEST METHOD; HARD COATINGS; TRIBOLOGICAL APPLICATIONS; HEAT-TREATMENT; TIN FILMS; TITANIUM; NITRIDE;
D O I：
10.1179/026708408X383966
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
TiB2 films were deposited on silicon wafers and AISI M2 steel substrates by pulsed dc close field unbalanced magnetron sputtering. The samples were annealed in an inert argon atmosphere at 673, 873 and 1073 K for 1 h. The structural changes due to annealing were evaluated using X-ray diffractometry and scanning electron microscopy. The mechanical properties of the films were characterised by microhardness and scratch tests. The microstructure, microhardness and adhesive strength of the films varied depending on the annealing temperature. While it was observed that the hardness and adhesion strength of TiB2 films annealed at 673 K improved, these properties decreased for the films that were annealed at higher temperatures.
引用
收藏
页码：567 / 570
页数：4
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