Nanocrystalline Ti Films Deposited by Modulated Pulsed Power Magnetron Sputtering

被引：0

作者：

Yang Chao ^{[1
]}

Jiang Bailing ^{[1
]}

Wang Di ^{[1
]}

Huang Bei ^{[1
]}

Dong Dan ^{[1
]}

机构：

[1] Xian Univ Technol, Xian 710048, Shaanxi, Peoples R China

来源：

RARE METAL MATERIALS AND ENGINEERING | 2019年 / 48卷 / 11期

关键词：

nanocrystalline; Ti film; modulated pulsed power magnetron sputtering; peak target power density; MECHANICAL-PROPERTIES; THIN-FILMS; NITRIDE COATINGS; TITANIUM; ADHESION; ARC; DC; MICROSTRUCTURE; PARAMETERS; DENSITY;

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Modulated pulsed power magnetron sputtering (MPPMS) has the ability to control the ionization rate, energy and quantity of deposited particles through adjusting the pulsed intensity and duration, thus modifying the nucleation and growth process of the thin film. Nanocrystalline Ti films were deposited using MPPMS technique in a closed field unbalanced magnetron sputtering (CFUBMS) system under different peak target power densities of the strong-ionized period (P-d). The modulated pulse power (MPP) was employed to modify the P-d by varying the pulse lengths and the average target powers. The results show that the nanocrystalline Ti film with a grain size of 11 nm exhibits a dense microstructure and a smooth surface (roughness of 11 nm) when the P-d is 0.86 kW.cm(-2). The improved properties of the as-prepared Ti film were also discussed.

引用

页码：3433 / 3440

页数：8

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