共 50 条
- [31] Measurement of the gas temperature of a radio-frequency-discharge plasma in an industrial planar reactor [J]. Mikroelektronika, 1996, 25 (03): : 221 - 225
- [32] Shallow trench etch with a planar inductively coupled plasma discharge [J]. PLASMA PROCESSING XII, 1998, 98 (04): : 222 - 230
- [33] Deposition Of Materials Using A Simple Planar Coil Radio Frequency Inductively Coupled Plasma System [J]. FRONTIERS IN PHYSICS-BOOK, 2009, 1150 : 436 - +
- [34] THE INDUCTIVELY COUPLED RF (RADIO-FREQUENCY) PLASMA [J]. PURE AND APPLIED CHEMISTRY, 1985, 57 (09) : 1321 - 1352
- [38] Parametric investigation of plasma uniformity in a dome-shaped inductively coupled plasma reactor [J]. PROCEEDINGS OF THE SECOND INTERNATIONAL SYMPOSIUM ON PROCESS CONTROL, DIAGNOSTICS, AND MODELING IN SEMICONDUCTOR MANUFACTURING, 1997, 97 (09): : 260 - 267