共 50 条
- [31] A Manufacturable Dual Channel (Si and SiGe) High-K Metal Gate CMOS Technology with Multiple Oxides for High Performance and Low Power Applications2011 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2011,Krishnan, S.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAKwon, U.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAMoumen, N.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAStoker, M. W.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAHarley, E. C. T.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USABedell, S.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USANair, D.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAGreene, B.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAHenson, W.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAChowdhury, M.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAPrakash, D. P.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAWu, E.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAIoannou, D.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USACartier, E.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USANa, M. -H.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAInumiya, S.论文数: 0 引用数: 0 h-index: 0机构: Toshiba America Electronic Components Inc, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAMcstay, K.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAEdge, L.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAIijima, R.论文数: 0 引用数: 0 h-index: 0机构: Toshiba America Electronic Components Inc, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USACai, J.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAFrank, M.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAHargrove, M.论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAGuo, D.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAKerber, A.论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAJagannathan, H.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAAndo, T.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAShepard, J.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USASiddiqui, S.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USADai, M.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USABu, H.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USASchaeffer, J.论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAJaeger, D.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USABarla, K.论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronic, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAWallner, T.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAUchimura, S.论文数: 0 引用数: 0 h-index: 0机构: Toshiba America Electronic Components Inc, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USALee, Y.论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAKarve, G.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAZafar, S.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USASchepis, D.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAWang, Y.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USADonaton, R.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USASaroop, S.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAMontanini, P.论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronic, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USALiang, Y.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAStathis, J.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USACarter, R.论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAPal, R.论文数: 0 引用数: 0 h-index: 0机构: GLOBALFOUNDRIES, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAParuchuri, V.论文数: 0 引用数: 0 h-index: 0机构: IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USAYamasaki, H.论文数: 0 引用数: 0 h-index: 0机构: Toshiba America Electronic Components Inc, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USALee, J-H.论文数: 0 引用数: 0 h-index: 0机构: Samsung Electronics, Hopewell Jct, NY 12533 USA IBM SRDC, 2070,Rt 52, Hopewell Jun, NY 12533 USA
- [32] Low-Power PTL-based Multiplexer Design in ±0.9V 32nm Dual-Gate Si FinFETPROCEEDINGS OF THE 3RD INTERNATIONAL CONFERENCE ON DEVICES, CIRCUITS AND SYSTEMS (ICDCS) 2016, 2016, : 204 - 207Khan, Amir论文数: 0 引用数: 0 h-index: 0机构: Aligarh Muslim Univ, Dept Elect Engn, Aligarh, Uttar Pradesh, India Aligarh Muslim Univ, Dept Elect Engn, Aligarh, Uttar Pradesh, India论文数: 引用数: h-index:机构:Ashraf, Syed Moeen论文数: 0 引用数: 0 h-index: 0机构: Aligarh Muslim Univ, Zakir Husain Coll Engn & Tech, Aligarh, Uttar Pradesh, India Aligarh Muslim Univ, Dept Elect Engn, Aligarh, Uttar Pradesh, IndiaKhan, Aquib Kamal论文数: 0 引用数: 0 h-index: 0机构: Aligarh Muslim Univ, Zakir Husain Coll Engn & Tech, Aligarh, Uttar Pradesh, India Aligarh Muslim Univ, Dept Elect Engn, Aligarh, Uttar Pradesh, India
- [33] Preliminary results on low power sigmoid neuron transistor response in 28 nm high-k metal gate Fully Depleted SOI technologySOLID-STATE ELECTRONICS, 2013, 89 : 17 - 21Galy, Ph论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38926 Crolles, France STMicroelectronics, F-38926 Crolles, FranceDehan, P.论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38926 Crolles, France STMicroelectronics, F-38926 Crolles, FranceJimenez, J.论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38926 Crolles, France STMicroelectronics, F-38926 Crolles, FranceHeitz, B.论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38926 Crolles, France STMicroelectronics, F-38926 Crolles, France
- [34] Low-Frequency Noise Investigation and Noise Variability Analysis in High-k/Metal Gate 32-nm CMOS TransistorsIEEE TRANSACTIONS ON ELECTRON DEVICES, 2011, 58 (08) : 2310 - 2316Lopez, Diana论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38921 Crolles, France Inst Microelect Electromagnetisme & Photon, Lab Hyperfrequences & Caracterisatio, F-38016 Grenoble, France STMicroelectronics, F-38921 Crolles, FranceHaendler, S.论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38921 Crolles, France STMicroelectronics, F-38921 Crolles, FranceLeyris, C.论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38921 Crolles, France STMicroelectronics, F-38921 Crolles, FranceBidal, Gregory论文数: 0 引用数: 0 h-index: 0机构: STMicroelectronics, F-38921 Crolles, France STMicroelectronics, F-38921 Crolles, FranceGhibaudo, Gerard论文数: 0 引用数: 0 h-index: 0机构: Inst Microelect Electromagnetisme & Photon, Lab Hyperfrequences & Caracterisatio, F-38016 Grenoble, France STMicroelectronics, F-38921 Crolles, France
- [35] A High-k, Metal Gate Vertical-Slit FET for Ultra-Low Power and High-Speed Applications2015 ANNUAL IEEE INDIA CONFERENCE (INDICON), 2015,Kumar, Somesh论文数: 0 引用数: 0 h-index: 0机构: Indian Inst Technol Ropar, Dept Elect Engn, Rupnagar 140001, PB, India Indian Inst Technol Ropar, Dept Elect Engn, Rupnagar 140001, PB, IndiaKaur, Sarabjeet论文数: 0 引用数: 0 h-index: 0机构: Indian Inst Technol Ropar, Dept Elect Engn, Rupnagar 140001, PB, India Indian Inst Technol Ropar, Dept Elect Engn, Rupnagar 140001, PB, IndiaSharma, Rohit论文数: 0 引用数: 0 h-index: 0机构: Indian Inst Technol Ropar, Dept Elect Engn, Rupnagar 140001, PB, India Indian Inst Technol Ropar, Dept Elect Engn, Rupnagar 140001, PB, India
- [36] Low-Leakage and Low-Trigger-Voltage SCR Device for ESD Protection in 28-nm High-k Metal Gate CMOS ProcessIEEE ELECTRON DEVICE LETTERS, 2016, 37 (11) : 1387 - 1390Lin, Chun-Yu论文数: 0 引用数: 0 h-index: 0机构: Natl Taiwan Normal Univ, Dept Elect Engn, Taipei 106, Taiwan Natl Taiwan Normal Univ, Dept Elect Engn, Taipei 106, TaiwanWu, Yi-Han论文数: 0 引用数: 0 h-index: 0机构: Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan Natl Taiwan Normal Univ, Dept Elect Engn, Taipei 106, TaiwanKer, Ming-Dou论文数: 0 引用数: 0 h-index: 0机构: Natl Chiao Tung Univ, Inst Elect, Hsinchu 300, Taiwan Natl Taiwan Normal Univ, Dept Elect Engn, Taipei 106, Taiwan
- [37] A Novel Damage-Free High-k Etch Technique Using Neutral Beam-Assisted Atomic Layer Etching (NBALE) for Sub-32nm Technology Node Low Power Metal Gate/High-k Dielectric CMOSFETs2009 IEEE INTERNATIONAL ELECTRON DEVICES MEETING, 2009, : 406 - +Min, K. S.论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA Sungkyunkwan Univ, Dept Adv Mat Sci &Engn, Suwon 440746, South Korea Univ Texas Austin, Dept Elect & Comp Engn, Austin, TX 78758 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USAKang, C. Y.论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USAPark, C.论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USAPark, C. S.论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA论文数: 引用数: h-index:机构:论文数: 引用数: h-index:机构:Hussain, M. M.论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USALee, Jack C.论文数: 0 引用数: 0 h-index: 0机构: Univ Texas Austin, Dept Elect & Comp Engn, Austin, TX 78758 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USALee, B. H.论文数: 0 引用数: 0 h-index: 0机构: Gwangiu Inst Sci & Technol, Gwangiu, South Korea SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USAKirsch, P.论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USATseng, H-H论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USAJammy, R.论文数: 0 引用数: 0 h-index: 0机构: SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USAYeom, G. Y.论文数: 0 引用数: 0 h-index: 0机构: Sungkyunkwan Univ, Dept Adv Mat Sci &Engn, Suwon 440746, South Korea SEMATECH, 2706 Montopolis Dr, Austin, TX 78741 USA
- [38] A Comparison of Analytical Modeling of Double Gate and Dual material Double Gate TFETs with high-K Stacked Gate-Oxide Structure for Low power Applications2018 CONFERENCE ON EMERGING DEVICES AND SMART SYSTEMS (ICEDSS), 2018, : 92 - 96Dharshana, V.论文数: 0 引用数: 0 h-index: 0机构: Thiagarajar Coll Engn, Madurai, Tamil Nadu, India Thiagarajar Coll Engn, Madurai, Tamil Nadu, IndiaFathima, A. Yasmina论文数: 0 引用数: 0 h-index: 0机构: Thiagarajar Coll Engn, Dept ECE, Madurai, Tamil Nadu, India Thiagarajar Coll Engn, Madurai, Tamil Nadu, IndiaHarinie, S.论文数: 0 引用数: 0 h-index: 0机构: Thiagarajar Coll Engn, Dept ECE, Madurai, Tamil Nadu, India Thiagarajar Coll Engn, Madurai, Tamil Nadu, IndiaPriamvatha, S. M. Bharathi论文数: 0 引用数: 0 h-index: 0机构: Thiagarajar Coll Engn, Dept ECE, Madurai, Tamil Nadu, India Thiagarajar Coll Engn, Madurai, Tamil Nadu, IndiaAjitha, V.论文数: 0 引用数: 0 h-index: 0机构: Thiagarajar Coll Engn, Dept ECE, Madurai, Tamil Nadu, India Thiagarajar Coll Engn, Madurai, Tamil Nadu, IndiaBalamurugan, N. B.论文数: 0 引用数: 0 h-index: 0机构: Thiagarajar Coll Engn, Dept ECE, Madurai, Tamil Nadu, India Thiagarajar Coll Engn, Madurai, Tamil Nadu, India
- [39] Impact of local back biasing on performance in hybrid FDSOI/bulk high-k/metal gate low power (LP) technologySOLID-STATE ELECTRONICS, 2013, 88 : 15 - 20Fenouillet-Beranger, C.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FrancePerreau, P.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceBenoist, T.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France MINATEC 3 Parvis Louis Neel, IMEP, F-38016 Grenoble 1, France STMicroeletronics, F-38926 Crolles, FranceRichier, C.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceHaendler, S.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FrancePradelle, J.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, FranceBustos, J.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceBrun, P.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceTosti, L.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceWeber, O.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceAndrieu, F.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceOrlando, B.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FrancePellissier-Tanon, D.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceAbbate, F.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceRichard, C.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceBeneyton, R.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceGregoire, M.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceDucote, J.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceGouraud, P.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceMargain, A.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceBorowiak, C.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceBianchini, R.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FrancePlanes, N.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceGourvest, E.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceBourdelle, K. K.论文数: 0 引用数: 0 h-index: 0机构: SOITEC, F-38926 Bernin, Crolles, France STMicroeletronics, F-38926 Crolles, FranceNguyen, B. Y.论文数: 0 引用数: 0 h-index: 0机构: SOITEC, F-38926 Bernin, Crolles, France STMicroeletronics, F-38926 Crolles, FrancePoiroux, T.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceSkotnicki, T.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceFaynot, O.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, FranceBoeuf, F.论文数: 0 引用数: 0 h-index: 0机构: STMicroeletronics, F-38926 Crolles, France STMicroeletronics, F-38926 Crolles, France
- [40] Comprehensive extensibility of 20nm low power/high performance technology platform featuring scalable high-k/metal gate planar transistors with reduced design corner2012 IEEE INTERNATIONAL ELECTRON DEVICES MEETING (IEDM), 2012,Fukutome, H.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaCheon, K. Y.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaKim, J. P.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaKim, J. C.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaLee, J. G.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaCha, S. Y.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaRoh, U. J.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaKwon, S. D.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaSohn, D. K.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South KoreaMaeda, S.论文数: 0 引用数: 0 h-index: 0机构: Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea Samsung Elect Co Ltd, Yongin 446711, Gyeonggi Do, South Korea