Study on Fabrication Process of SU8 Photoresist Microstructures and Evaluation of Stress Gradient

被引：0
|
作者：
Hua, Rong [1 ]
Jian, Wei [1 ]
Xi, Chen [1 ]
机构：
[1] Nanjing Normal Univ, Sch Phys Sci & Technol, Nanjing 210023, Jiangsu, Peoples R China
来源：
MICRO-NANO TECHNOLOGY XV | 2014年 / 609-610卷
关键词：
SU-8 MEMS microstructure; sacrifice layer technology; stress gradient;
D O I：
10.4028/www.scientific.net/KEM.609-610.740
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A fabrication process to manufacture SU8 photoresist microstructures is presented in which BP212 positive photoresist was used as sacrifice layer and SU8 was used as structure layer. No crack has been observed in the obtained microstructures. The relation between PEB temperature and stress gradient in SU8 film has been studied by measuring radii of released SU8 cantilevers made at different PEB temperatures.
引用
收藏
页码：740 / 744
页数：5
相关论文
共 50 条
  • [31] Tapered SU8 Waveguide for Evanescent Sensing by Single-Step Fabrication
    Xin, Yu
    Pandraud, Gregory
    van Langen-Suurling, Anja
    French, Paddy
    2017 IEEE SENSORS, 2017, : 187 - 189
  • [32] Micromachined 40 GHz Post-Supported Patch Array Using Thick SU8 Photoresist
    Liu, Wendong
    Wang, Han
    Zhang, Zhijun
    Feng, Zhenghe
    2014 IEEE ANTENNAS AND PROPAGATION SOCIETY INTERNATIONAL SYMPOSIUM (APSURSI), 2014, : 1083 - 1084
  • [33] Process optimization of optical lithography of SU-8 photoresist
    Zhang, Ye
    Chen, Di
    Zhang, Jinya
    Zhu, Jun
    Liu, Jingquan
    Zhongguo Jixie Gongcheng/China Mechanical Engineering, 2005, 16 (SUPPL.): : 437 - 440
  • [34] Drift study of SU8 cantilevers in liquid and gaseous environments
    Tenje, Maria
    Keller, Stephan
    Dohn, Soren
    Davis, Zachary J.
    Boisen, Anja
    ULTRAMICROSCOPY, 2010, 110 (06) : 596 - 598
  • [35] Experimental study on ultrasonic stress relief for cured SU-8 photoresist layer
    Du Liqun
    Wang Qijia
    MICROELECTRONIC ENGINEERING, 2010, 87 (12) : 2555 - 2560
  • [36] Fabrication of multi-layer SU-8 microstructures
    Mata, A
    Fleischman, AJ
    Roy, S
    JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2006, 16 (02) : 276 - 284
  • [37] Comparison of Conventional and Variable Frequency Microwave Curing of SU8 Photoresist: Effects on the Dielectric, Thermal, and Morphological Properties
    Wattanachai, Piyachat
    Antonio, Christian
    ENGINEERING JOURNAL-THAILAND, 2016, 20 (05): : 169 - 186
  • [38] Two-photon laser lithography of photonic microstructures in photoresist SU-8
    Mizeikis, V
    Seet, KK
    Juodkazis, S
    Jarutis, V
    Misawa, H
    2005 PACIFIC RIM CONFERENCE ON LASERS AND ELECTRO-OPTICS, 2005, : 1037 - 1038
  • [39] Fabrication of the Superhydrophobic Surface Using SU-8 Photoresist with Black Silicon
    Lee, Sang Eon
    Lee, Dongjin
    Kim, Jin-Ha
    Lee, Kang Won
    Lee, Kwang-Cheol
    Hong, Seong Uk
    Lee, Seung S.
    PROCEEDINGS OF THE ASME INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION, 2011, VOL 11, 2012, : 407 - 410
  • [40] Undistorted 3D microstructures in SU8 formed through two-photon polymerization
    Ohlinger, Kris
    Lin, Yuankun
    Poole, Zsolt
    Chen, Kevin P.
    AIP ADVANCES, 2011, 1 (03):
12345