Study on Fabrication Process of SU8 Photoresist Microstructures and Evaluation of Stress Gradient

被引：0
|
作者：
Hua, Rong [1 ]
Jian, Wei [1 ]
Xi, Chen [1 ]
机构：
[1] Nanjing Normal Univ, Sch Phys Sci & Technol, Nanjing 210023, Jiangsu, Peoples R China
来源：
MICRO-NANO TECHNOLOGY XV | 2014年 / 609-610卷
关键词：
SU-8 MEMS microstructure; sacrifice layer technology; stress gradient;
D O I：
10.4028/www.scientific.net/KEM.609-610.740
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
A fabrication process to manufacture SU8 photoresist microstructures is presented in which BP212 positive photoresist was used as sacrifice layer and SU8 was used as structure layer. No crack has been observed in the obtained microstructures. The relation between PEB temperature and stress gradient in SU8 film has been studied by measuring radii of released SU8 cantilevers made at different PEB temperatures.
引用
收藏
页码：740 / 744
页数：5
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