Spatial point analysis of quantum dot nucleation sites on InAs wetting layer

被引:11
|
作者
Konishi, Tomoya [1 ]
Tsukamoto, Shiro [1 ]
机构
[1] Anan Natl Coll Technol, Tokushima 7740017, Japan
关键词
Semiconductor; MBE; STM; Wetting layer; Quantum dot; Nucleation; Spatial point analysis; Nearest-neighbor distance; GROWTH; SURFACE; GAAS;
D O I
10.1016/j.susc.2010.12.034
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
We perform spatial point analysis of InAs quantum dot (QD) nucleation sites and surface reconstruction domain patterns on an InAs wetting layer to investigate QD nucleation mechanisms in Stranski-Krastanow growth mode. An InAs wetting layer on a GaAs(001) substrate has been observed at 300 degrees C by using in situ scanning tunneling microscopy (STM) preceding QD formation. A nearest-neighbor analysis of the STM images finds that the point pattern of QD precursors is similar to that of (1 x 3)/(2 x 3) surface reconstruction domains which are specific to Ga-rich fluctuation. This provides the evidence that InAs QD nucleation is induced by Ga-rich fluctuation within an InAs wetting layer, as a technical implication for site-controlled QD growth for various QD devices. (C) 2011 Elsevier B.V. All rights reserved.
引用
收藏
页码:L1 / L5
页数:5
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