Air sensitive tin dioxide thin films by magnetron sputtering and thermal oxidation technique

被引：41
|
作者：
Shishkin, NY [1 ]
Zharsky, IM [1 ]
Lugin, VG [1 ]
Zarapin, VG [1 ]
机构：
[1] Belorussian State Univ Technol, Minsk 220630, BELARUS
来源：
SENSORS AND ACTUATORS B-CHEMICAL | 1998年 / 48卷 / 1-3期
关键词：
tin dioxide; thin films; oxygen sensitivity;
D O I：
10.1016/S0925-4005(98)00104-X
中图分类号：
O65 [分析化学];
学科分类号：
070302 ; 081704 ;
摘要：
By the method of magnetron sputtering of metal tin and oxidation of the layer, a thin film of non-porous stoichiometric tin dioxide was obtained. Sensitive properties of the films to air oxygen in the temperature interval of 150-300 degrees C were investigated. The phenomena of conductivity type changing versus oxygen pressure was found. (C) 1998 Elsevier Science S.A. All rights reserved.
引用
收藏
页码：403 / 408
页数：6
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