Structural parameters and polarization properties of TiN thin films, prepared by reactive magnetron sputtering

被引：2
|
作者：
Solovan, M. M. [1 ]
Brus, V. V. [1 ]
Pidkamin, L. J. [1 ]
Maryanchuk, P. D. [1 ]
Dobrovolsky, Yu G. [2 ]
机构：
[1] Chernivtsi Natl Univ, Dept Elect & Energy Engn, Dept Opt & Polig, UA-58012 Chernovtsy, Ukraine
[2] Res & Dev Co Tensor, Chernovtsy, Ukraine
来源：
TWELFTH INTERNATIONAL CONFERENCE ON CORRELATION OPTICS | 2015年 / 9809卷
关键词：
TiN; thin film; structural properties; polarimetry; ELECTRICAL-PROPERTIES; OPTICAL-PROPERTIES; FEATURES;
D O I：
10.1117/12.2228981
中图分类号：
O43 [光学];
学科分类号：
070207 ; 0803 ;
摘要：
We report the results of the investigation of morphological, structural, optical and plarimeteric properties of titanium nitride thin films deposited on silicon and glass substrates. The magnetron sputtered titanium nitride thin films were established to possess crystalline structure with the average grain size about D = 15 nm. The method of correlation matrix is was applied for the analysis of polarization properties of scattered light by the titanium nitride thin film. The obtained experimental result, can be explained by the presence of the effects of linear and circular dichroism in the material of the titanium nitride thin films under investigations.
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页数：8
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