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- [3] Thickness Dependence of Indium-Tin Oxide Thin Films Deposited by RF Magnetron Sputtering [J]. MICROELECTRONICS TECHNOLOGY AND DEVICES - SBMICRO 2010, 2010, 31 (01): : 117 - 124
- [5] Characteristics of indium tin oxide films deposited by DC and RF magnetron sputtering [J]. Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2001, 40 (5 A): : 3364 - 3369
- [6] Characteristics of indium tin oxide films deposited by DC and RF magnetron sputtering [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2001, 40 (5A): : 3364 - 3369
- [8] Annealing effects on properties of antimony tin oxide thin films deposited by RF reactive magnetron sputtering [J]. SURFACE & COATINGS TECHNOLOGY, 2004, 184 (2-3): : 188 - 193
- [10] Synthesis of Tantalum-Doped Tin Oxide Thin Films by Magnetron Sputtering for Photovoltaic Applications [J]. Journal of Electronic Materials, 2017, 46 : 3667 - 3673