Compositionally and structurally graded layers prepared by plasma-based ion implantation on 2024 aluminum alloy

被引:0
|
作者
Liao, J. X. [1 ]
Tian, Z. [1 ]
Xu, J. [1 ]
Jin, L. [1 ]
机构
[1] Univ Elect Sci & Technol China, Res Inst Elect Sci & Technol, Chengdu 610054, Peoples R China
关键词
graded layer; plasma-based ion implantation; diamond-like carbon; aluminum alloy;
D O I
暂无
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
AlN/Ti/TiN/DLC graded layers have been prepared by plasma-based ion implantation (PBII) orderly with nitrogen / titanium / nitrogen and titanium / carbon on 2024 aluminum alloy. The structures of the graded layers have been characterized by XPS, XRD, TEM, AFM and Raman spectrum. The graded layer exhibits gradually compositional and structural change. PBII respectively with nitrogen / titanium / nitrogen and titanium / carbon can respectively form a layer rich in AlN, alpha-Ti, TiN, and sp(3) bond carbons. Every two adjacent layers are connected with a transition layer with intermediate phase such as TiC, TiCN, CNx, TiAl3, and TiO2. The intermediate phases are caused by the implantation, diffusion or recoil-implantation of nitrogen, carbon, oxygen, etc. A proper graded layer has been obtained by optimizing PBII parameters, and corresponds to the most significantly improved hardness and tribological properties.
引用
收藏
页码:163 / +
页数:3
相关论文
共 50 条
  • [31] Tribological behavior of different films on Ti-6Al-4V alloy prepared by plasma-based ion implantation
    季红兵
    夏立芳
    马欣新
    孙跃
    Transactions of Nonferrous Metals Society of China, 2000, (04) : 493 - 497
  • [32] Simulation of plasma-based ion implantation of a sawtooth target
    Sheridan, TE
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 225 - 228
  • [33] Comparison of surface layers on copper, titanium and tantalum created by methane plasma-based ion implantation
    Kraft, G.
    Flege, S.
    Baba, K.
    Hatada, R.
    Ensinger, W.
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2008, 205 (04): : 985 - 988
  • [34] Effects of target voltage on the structure of the film prepared by plasma-based ion implantation and deposition method
    Yukimura, K
    Kuze, E
    Kumagai, M
    Maruyama, T
    Kohata, M
    Numata, K
    Saito, H
    Ma, XX
    SURFACE & COATINGS TECHNOLOGY, 2003, 169 : 472 - 474
  • [35] Simulation of plasma-based ion implantation of a sawtooth target
    Sheridan, T.E.
    Surface and Coatings Technology, 1997, 93 (2-3): : 225 - 228
  • [36] Carbon nanometer films prepared by plasma-based ion implantation on single crystalline Si wafer
    Liao, JX
    Liu, WM
    Xu, T
    Xue, QJ
    APPLIED SURFACE SCIENCE, 2004, 226 (04) : 387 - 392
  • [37] Plasma-based ion implantation sterilization technique and ion energy estimation
    Tanaka, T
    Watanabe, S
    Shibahara, K
    Yokoyama, S
    Takagi, T
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2005, 23 (04): : 1018 - 1021
  • [38] Tribological behavior of TiC/DLC multilayers prepared on Ti-6Al-4V alloy by plasma-based ion implantation
    Ji, HB
    Xia, LF
    Ma, XX
    Sun, Y
    Sun, MR
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (06): : 2575 - 2580
  • [39] A pulsed inductively coupled plasma source for plasma-based ion implantation
    Tuszewski, M
    Scheuer, JT
    Adler, RA
    SURFACE & COATINGS TECHNOLOGY, 1997, 93 (2-3): : 203 - 208
  • [40] Tribological properties of Ti-Al-N films prepared by plasma-based ion implantation mixing
    Sue, Y
    Tang, GZ
    Ma, XX
    TRANSACTIONS OF NONFERROUS METALS SOCIETY OF CHINA, 2003, 13 : 213 - 217