Impact of process and temperature variations on network-on-chip design exploration

被引:0
|
作者
Bin Li [1 ]
Peh, Li-Shiuan [1 ]
Patra, Priyadarsan [2 ]
机构
[1] Princeton Univ, Dept EE, Princeton, NJ 08544 USA
[2] Intel Corp, Hillsboro, OR 97124 USA
关键词
D O I
10.1109/NOCS.2008.19
中图分类号
TP3 [计算技术、计算机技术];
学科分类号
0812 ;
摘要
With the continuing scaling of CMOS technologies, process variation is becoming a key factor highly impacting system-level power and temperature. Traditional methods of assuming a uniform temperature and no process variation can lead to gross inaccuracies even for system-level design, thus it is critical to consider the affects of process variation and temperature variation during early design exploration. In this paper we describe the implementation of an architecture-level early-stage design space exploration tool that incorporates the effect of process and temperature variation for Network-on-chips(NoC). The tool is used to stud), the impact of process and temperature variations on power and energy-delay-product-per-flit metrics for different NoC architectures, and our simulation results show that design choices are influenced by the effects of process and temperature variation, thus demonstrating the importance of considering, and enabling the high-level impact analysis of process and temperature variation early in the design flow.
引用
收藏
页码:117 / +
页数:3
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