Improvement in crystallinity of ZnO films prepared by rf magnetron sputtering with grid electrode

被引：16

作者：

Yasui, K ^{[1
]}

Phuong, NV ^{[1
]}

Kuroki, Y ^{[1
]}

Takata, M ^{[1
]}

Akahane, T ^{[1
]}

机构：

[1] Nagaoka Univ Technol, Dept Elect Elect & Informat Engn, Nagaoka, Niigata 9402188, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2005年 / 44卷 / 1B期

关键词：

zinc oxide; magnetron sputtering; grid electrode; negative bias; crystallinity;

D O I：

10.1143/JJAP.44.684

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

ZnO films were prepared on Si and quartz substrates by rf magnetron sputtering with a mesh grid electrode. The influence of a negative grid bias on the crystallinity and optical property of ZnO films was investigated. At an appropriate dc grid bias, ZnO films with good crystallinity were grown from room temperature to 300 degrees C. The number of stacking faults, which were observed in the X-ray diffraction spectra of the films deposited without the grid electrode, decreased in the films deposited with the grid electrode. All ZnO films showed a high transmittance in the visible region.

引用

页码：684 / 687

页数：4

共 50 条

[31] Gas sensing properties of ZnO:Al thin films prepared by RF magnetron sputtering
Teoh, Lay Gaik
Chen, Hong Ming
Su, Yen Hsun
Lai, Wei Hao
Chou, Shih Min
Hon, Min Hsiung
[J]. 2006 IEEE INTERNATIONAL CONFERENCE ON SEMICONDUCTOR ELECTRONICS, PROCEEDINGS, 2006, : 142 - +
[32] Effect of Ar pressure on properties of ZnO:Al films prepared by RF magnetron sputtering
Song, Dengyuan
Wang, Yongqing
Sun, Rongxia
Zong, Xiaoping
Guo, Baozeng
[J]. Pan Tao Ti Hsueh Pao/Chinese Journal of Semiconductors, 2002, 23 (10): : 1078 - 1082
[33] Effect of in Doping on Thermoelectric and Magnetoresistive Properties of ZnO Films Prepared by RF Magnetron sputtering
Fang, L.
Ruan, H. B.
Peng, L. P.
Yang, X. F.
Wu, F.
Kong, C. Y.
[J]. ADVANCED STRUCTURAL AND FUNCTIONAL MATERIALS FOR PROTECTION, 2012, 185 : 37 - +
[34] Characterization of luminescent properties of ZnO:Er thin films prepared by rf magnetron sputtering
Song, Hyundon
Kim, Young Jin
[J]. JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 2007, 27 (13-15) : 3745 - 3748
[35] Self-texture control of ZnO films prepared by reactive RF magnetron sputtering
Novak, Petr
Sutta, Pavol
Netrvalova, M.
Riha, Jan
Medlin, Rostislav
[J]. MATERIALS AND APPLICATIONS FOR SENSORS AND TRANSDUCERS III, 2014, 605 : 219 - 222
[36] Influence of deposition temperature on the crystallinity of Al-doped ZnO thin films at glass substrates prepared by RF magnetron sputtering method
Zhang, Zhiyun
Bao, Chonggao
Yao, Wenjing
Ma, Shengqiang
Zhang, Lili
Hou, Shuzeng
[J]. SUPERLATTICES AND MICROSTRUCTURES, 2011, 49 (06) : 644 - 653
[37] Textured ZnO thin films by RF magnetron sputtering
Ginting, M
Lee, JC
Kang, KH
Kim, SK
Yoon, KH
Park, IJ
Song, JS
[J]. JOURNAL OF THE KOREAN PHYSICAL SOCIETY, 1999, 34 : S343 - S346
[38] Properties of ITO films prepared by rf magnetron sputtering
El Akkad, F.
Punnoose, A.
Prabu, G.
[J]. Applied Physics A: Materials Science and Processing, 2000, 71 (02): : 157 - 160
[39] Properties of ITO films prepared by rf magnetron sputtering
F. El Akkad
A. Punnoose
G. Prabu
[J]. Applied Physics A, 2000, 71 (2) : 157 - 160
[40] Properties of ITO films prepared by rf magnetron sputtering
El Akkad, F
Punnoose, A
Prabu, G
[J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2000, 71 (02): : 157 - 160

← 1 2 3 4 5 →