Investigation of the SiC/(SiC)1-x(AlN)x heterostructures by the method of capacitance-voltage characteristics

被引:1
|
作者
Kurbanov, MK [1 ]
Bilalov, BA [1 ]
Nurmagomedov, SA [1 ]
Safaraliev, GK [1 ]
机构
[1] Dagestan State Univ, Makhachkala 327025, Dagestan, Russia
关键词
Magnetic Material; Basic Property; Electromagnetism; Sublimation Epitaxy; Abrupt Heterojunctions;
D O I
10.1134/1.1349934
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Using the method of measuring and analyzing the capacitance-voltage characteristics, it is found that the n-6H-SiC/p-(SiC)(1-x)(AlN)(x) heterostructures obtained by sublimation epitaxy of the (SiC)(1-x)(AlN)(x) layers on the 6H-SiC substrates have abrupt heterojunctions similar to 10(-4) cm thick. The basic properties of heterostructures, which depend on the epilayer composition and temperature, were determined from the capacitance-voltage characteristics. (C) 2001 MAIK "Nauka/Interperiodica".
引用
收藏
页码:209 / 211
页数:3
相关论文
共 50 条
  • [41] (SiC)x(AlN)1-x Solid-Solution Substrate for High Temperature and High Power Devices
    Singh, Narsingh B.
    Wagner, Brian
    Berghmans, Andre
    Knuteson, David J.
    McLaughlin, Sean.
    Kahler, David
    Thomson, Darren
    King, Matthew
    CRYSTAL GROWTH & DESIGN, 2010, 10 (08) : 3508 - 3514
  • [42] Photoelectrochemical capacitance-voltage measurements of 4H-SiC
    Stutz, CE
    JOURNAL OF ELECTRONIC MATERIALS, 1998, 27 (12) : L81 - L83
  • [43] Photoelectrochemical capacitance-voltage measurements of 4H-SiC
    C. E. Stutz
    Journal of Electronic Materials, 1998, 27 : L81 - L83
  • [44] Structural properties of the epitaxial (SiC)1-x (AlN) x solid solution films fabricated by magnetron sputtering of SiC-Al composite targets
    Ramazanov, Sh M.
    Kurbanov, M. K.
    Safaraliev, G. K.
    Bilalov, B. A.
    Kargin, N. I.
    Gusev, A. S.
    TECHNICAL PHYSICS LETTERS, 2014, 40 (04) : 300 - 302
  • [45] Surface potential analysis of AlN/GaN heterostructures by electrochemical capacitance-voltage measurements
    Pietzka, C.
    Li, G.
    Alomari, M.
    Xing, H.
    Jena, D.
    Kohn, E.
    JOURNAL OF APPLIED PHYSICS, 2012, 112 (07)
  • [46] Capacitance-voltage characterization of AlN MIS structures grown on 6H-SiC(0001) substrates by MOCVD
    Hageman, W
    Rys, A
    Schmitt, J
    Edgar, JH
    Liu, B
    Koleske, DD
    INTERNATIONAL WORKSHOP ON NITRIDE SEMICONDUCTORS, PROCEEDINGS, 2002, : 129 - 132
  • [47] Growth of epitaxial (SiC)x(AlN)1-x thin films on 6H-SiC by ion-assisted dual magnetron sputter deposition
    Tungasmita, S
    Persson, POÅ
    Seppänen, T
    Hultman, L
    Birch, J
    SILICON CARBIDE AND RELATED MATERIALS 2001, PTS 1 AND 2, PROCEEDINGS, 2002, 389-3 : 1481 - 1484
  • [48] Frequency dispersion in capacitance-voltage characteristics of AlGaN/GaN heterostructures
    Shealy, James R.
    Brown, Richard J.
    APPLIED PHYSICS LETTERS, 2008, 92 (03)
  • [49] Ferromagnetism in graphene-Mn(x)Si(1-x) heterostructures grown on 6H-SiC(0001)
    Magnano, E.
    Bondino, F.
    Cepek, C.
    Sangaletti, L.
    Mozzati, M. C.
    Parmigiani, F.
    JOURNAL OF APPLIED PHYSICS, 2012, 111 (01)
  • [50] Studies of buried (SiC)1-x(AlN)x layers formed by co-implantation of N+ and Al+ ions into 6H-SiC
    Pezoldt, J
    Yankov, RA
    Voelskow, M
    Brauer, G
    Anwand, W
    Heera, V
    Skorupa, W
    Coleman, PG
    DEFECT RECOGNITION AND IMAGE PROCESSING IN SEMICONDUCTORS 1997, 1998, 160 : 335 - 338