Effects of post-annealing on the microstructure and ferroelectric properties of YMnO3 thin films on Si

被引:12
|
作者
Yoo, DC
Lee, JY
Kim, IS
Kim, YT
机构
[1] Korea Adv Inst Sci & Technol, Dept Mat Sci & Engn, Yuseong Gu, Taejon 305701, South Korea
[2] Korea Inst Sci & Technol, Semicond Mat Lab, Seoul 136791, South Korea
关键词
transmission electron microscopy; yittrium compounds; ferroelectric materials;
D O I
10.1016/S0022-0248(01)01563-9
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
YMnO3 thin films deposited on Si (100) substrate by rf-sputtering were annealed with various conditions. YMnO3 films annealed in a furnace had a c-axis preferred orientation and the films annealed in a rapid thermal processor (RTP) had random orientations. However, cracks were observed in the highly c-axis oriented YMnO3 films. YMnO3 films annealed in the furnace showed poor ferroelectric characteristics. However, YMnO3 films annealed in the RTP showed a ferroelectric C-V hysteresis with 1.5 V memory window at 0.2 V/s sweep rate. Since the thermal expansion of a-axis is five times higher than that of c-axis in the YMnO3 thin films, the c-axis oriented thin films are expected to be easily cracked during the post-annealing process. Moreover, the rapid thermal annealing process effectively suppressed the increase of a native SiO2 thickness in the YMnO3/Si structure. (C) 2001 Published by Elsevier Science B.V.
引用
收藏
页码:243 / 247
页数:5
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