An Anomalous Correlation between Gate Leakage Current and Threshold Voltage Fluctuation in Advanced MOSFETs

被引:0
|
作者
Liu, Zihong [1 ]
Chang, Paul [2 ]
Yu, Xiaojun [2 ]
Deng, Jie [2 ]
Han, Shu-Jen [2 ]
Shahidi, Ghavam [1 ]
Haensch, Wilfried [1 ]
Rim, Ken [2 ]
机构
[1] IBM TJ Watson Res Ctr, Yorktown Hts, NY 10598 USA
[2] IBM Corp, Semicond Res & Dev Ctr, Hopewell Jct, NY 12533 USA
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An anomalous correlation of gate leakage current and threshold voltage fluctuation in aggressively scaled MOSFETs is revealed and analyzed by statistical technique and a corresponding physical model is proposed. For a range of threshold voltage (V-t) design, gate leakage at fixed gate and drain bias increases with V-t before it decreases at higher V-t. The behavior can be accurately explained by a trade-off between two mechanisms ("two reversed functions"): V-t roll-off effect and gate leakage current density dependence on surface potential.
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页数:4
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