Fast-bit-limited lifetime modeling of advanced floating gate non-volatile memories

被引:11
|
作者
Scarpa, A [1 ]
Tao, G [1 ]
Dijkstra, J [1 ]
Kuper, FG [1 ]
机构
[1] Philips Semicond, NL-6534 NE Nijmegen, Netherlands
关键词
D O I
10.1109/IRWS.2000.911894
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The few fast bits, resulting from stress induced leakage current, that are found in a memory array limit lifetime of an entire device. instead of classical temperature accelerated tests, 'simple' gate stress represents therefore the correct method to study the advanced non-volatile memory retention behavior. In this paper a model is proposed to predict the memory lifetime under use conditions based on accelerated gate stress measurements. The model considers a statistical approach, in order to overcome the erratic behavior of fast bits. It enables predicting the lifetime of memory. products as function of memory size and number of write/erase cycles. Application of the model is discussed as well as a wafer level implementation form.
引用
收藏
页码:24 / 28
页数:5
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