3D RRAM DESIGN AND BENCHMARK WITH 3D NAND FLASH

被引:0
|
作者
Chen, Pai-Yu [1 ]
Xu, Cong [2 ]
Xie, Yuan [2 ]
Yu, Shimeng [1 ]
机构
[1] Arizona State Univ, Tempe, AZ 85283 USA
[2] Penn State Univ, University Pk, PA 16802 USA
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中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The monolithic 3D integration of resistive switching random access memory (RRAM) is one attractive approach to build high-density non-volatile memory. In this paper, the design considerations of 3D vertical RRAM architecture are presented from the device, circuit to system level. Due to the voltage drop and sneak path problem, the sub-array size of the 3D NAND is still limited as compared with that of the 3D NAND. To be cost-competitive with the 3D NAND, high on-state resistance, high I-V nonlinearity and low interconnect resistivity is required to enable Mb 3D RRAM sub-array. Although the 3D RRAM has disadvantage in array efficiency (consequently in cost per bit) than the 3D NAND, the 3D RRAM outperforms the 3D NAND In throughput performance at system-level.
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页数:4
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