Recent Progress on 3D NAND Flash Technologies

被引:62
|
作者
Goda, Akira [1 ]
机构
[1] Micron Memory Japan, Tokyo 1440052, Japan
关键词
3D NAND; floating gate cell; charge-trap cell; CMOS under array; MEMORY;
D O I
10.3390/electronics10243156
中图分类号
TP [自动化技术、计算机技术];
学科分类号
0812 ;
摘要
Since 3D NAND was introduced to the industry with 24 layers, the areal density has been successfully increased more than ten times, and has exceeded 10 Gb/mm(2) with 176 layers. The physical scaling of XYZ dimensions including layer stacking and footprint scaling enabled the density scaling. Logical scaling has been successfully realized, too. TLC (triple-level cell, 3 bits per cell) is now the mainstream in 3D NAND, while QLC (quad-level cell, 4 bits per cell) is increasing the presence. Several attempts and partial demonstrations were made for PLC (penta-level cell, 5 bits per cell). CMOS under array (CuA) enabled the die size reduction and performance improvements. Program and erase schemes to address the technology challenges such as short-term data retention of the charge-trap cell and the large block size are being investigated.
引用
收藏
页数:16
相关论文
共 50 条
  • [1] Architecture and Process Integration Overview of 3D NAND Flash Technologies
    Lee, Geun Ho
    Hwang, Sungmin
    Yu, Junsu
    Kim, Hyungjin
    [J]. APPLIED SCIENCES-BASEL, 2021, 11 (15):
  • [2] OVERVIEW OF 3D NAND FLASH AND PROGRESS OF SPLIT-PAGE 3D VERTICAL GATE (3DVG) NAND ARCHITECTURE
    Du, Pei-Ying
    Lue, Hang-Ting
    Shih, Yen-Hao
    Hsieh, Kuang-Yeu
    Lu, Chih-Yuan
    [J]. 2014 12TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT), 2014,
  • [3] Overview of 3D NAND Flash and Progress of Vertical Gate (VG) Architecture
    Lue, Hang-Ting
    Chen, Shih-Hung
    Shih, Yen-Hao
    Hsieh, Kuang-Yeu
    Lu, Chih-Yuan
    [J]. 2012 IEEE 11TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT-2012), 2012, : 914 - 917
  • [4] Recent Progress of 3D Printed Microfluidics Technologies
    Fan Yi-Qiang
    Wang Mei
    Zhang Ya-Jun
    [J]. CHINESE JOURNAL OF ANALYTICAL CHEMISTRY, 2016, 44 (04) : 551 - 561
  • [5] 3D NAND Flash Status and Trends
    Heineck, Lars
    Liu, Jin
    [J]. 2022 14TH IEEE INTERNATIONAL MEMORY WORKSHOP (IMW 2022), 2022, : 1 - 4
  • [6] 3D stacked NAND flash memories
    Micheloni, Rino
    Crippa, Luca
    [J]. 3D Flash Memories, 2016, : 63 - 83
  • [7] 3D RRAM DESIGN AND BENCHMARK WITH 3D NAND FLASH
    Chen, Pai-Yu
    Xu, Cong
    Xie, Yuan
    Yu, Shimeng
    [J]. 2014 12TH IEEE INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUIT TECHNOLOGY (ICSICT), 2014,
  • [8] Overview of 3D NAND Technologies and Outlook
    Venkatesan, Srinath
    Aoulaiche, Marc
    [J]. 2018 NON-VOLATILE MEMORY TECHNOLOGY SYMPOSIUM (NVMTS 2018), 2018,
  • [9] Vertical 3D NAND Flash Memory Technology
    Nitayama, Akihiro
    Aochi, Hideaki
    [J]. ULSI PROCESS INTEGRATION 7, 2011, 41 (07): : 15 - 25
  • [10] Error Generation for 3D NAND Flash Memory
    Liu, Weihua
    Wu, Fei
    Meng, Songmiao
    Chen, Xiang
    Xie, Changsheng
    [J]. PROCEEDINGS OF THE 2022 DESIGN, AUTOMATION & TEST IN EUROPE CONFERENCE & EXHIBITION (DATE 2022), 2022, : 56 - 59