High resolution x-ray scattering investigation of Pt/LaF3/Si(111) structures

被引：2
|
作者：
Fanchenko, SS
Jedrecy, N
Moritz, W
Nefedov, AA
机构：
[1] RRC Kurchatov Inst, Moscow 123182, Russia
[2] Ctr Univ Orsay, CNRS, CEA, LURE, F-91405 Orsay, France
[3] Humboldt Univ, D-10117 Berlin, Germany
来源：
PHYSICA B | 1998年 / 248卷
关键词：
X-ray scattering; Pt/LaF3/Si samples;
D O I：
10.1016/S0921-4526(98)00201-4
中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
摘要：
Recently developed high resolution X-ray methods have been used to characterize the structure of Pt/LaF3/Si samples. The asymptotic Bragg diffraction is used for the study of the LaF3/Si interface and the grazing-incidence X-ray diffraction (GIXD) for the study of the LaF3, texture. The LaF3/Si interface was found to be thin and smooth with the interface thickness value 0.55 +/- 0.1 nm. The essential extra-broadening of the main peak in diffraction experiments for samples with the top platinum layer is explained by the small angle scattering of the X-ray beam on the rough Pt film. The LaF3-film domain structure is derived from GIXD data. (C) 1998 Elsevier Science B.V. All rights reserved.
引用
收藏
页码：48 / 52
页数：5
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