Characterization of interface roughness in W/Si multilayers by high resolution diffuse X-ray scattering

被引：0
|
作者：
Salditt, T. [1 ]
Lott, D. [1 ]
Metzger, T.H. [1 ]
Peisl, J. [1 ]
Vignaud, G. [1 ]
Legrand, J.F. [1 ]
Gruebel, G. [1 ]
Hoghoi, P. [1 ]
Schaerpf, O. [1 ]
机构：
[1] Universitaet Muenchen, Muenchen, Germany
来源：
Physica B: Condensed Matter | 1996年 / 221卷 / 1-4期
关键词：
Number:; 055WMAXI5; Acronym:; -; Sponsor:;
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页码：13 / 17
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