Etching error analysis of dot grating array in micro-lithography fabrication

被引：0
|
作者：
Bao, NK [1 ]
Chen, ZY [1 ]
机构：
[1] City Univ Hong Kong, Optoelect Res Ctr, Hong Kong, Hong Kong, Peoples R China
来源：
Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3 | 2005年 / 5752卷
关键词：
dot grating array; error analysis; binary optics; electro-beam lithography;
D O I：
10.1117/12.598161
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper described the error effect in fabricating process of dot grating array using the Electro-Beam Lithography (EBL). These errors show the change in the width and depth of each pixel of binary optical element (BOE). It will directly induce the errors of the position and phase of transmission beam. The experimental simulating results are compared with that of the theoretical ones.
引用
收藏
页码：827 / 835
页数：9
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