Etching error analysis of dot grating array in micro-lithography fabrication

被引：0
|
作者：
Bao, NK [1 ]
Chen, ZY [1 ]
机构：
[1] City Univ Hong Kong, Optoelect Res Ctr, Hong Kong, Hong Kong, Peoples R China
来源：
Metrology, Inspection, and Process Control for Microlithography XIX, Pts 1-3 | 2005年 / 5752卷
关键词：
dot grating array; error analysis; binary optics; electro-beam lithography;
D O I：
10.1117/12.598161
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
This paper described the error effect in fabricating process of dot grating array using the Electro-Beam Lithography (EBL). These errors show the change in the width and depth of each pixel of binary optical element (BOE). It will directly induce the errors of the position and phase of transmission beam. The experimental simulating results are compared with that of the theoretical ones.
引用
收藏
页码：827 / 835
页数：9
相关论文
共 50 条
  • [31] Large-area micro/nanostructures fabrication in quartz by laser interference lithography and dry etching
    Liu, C. H.
    Hong, M. H.
    Lum, M. C.
    Flotow, H.
    Ghadessy, F.
    Zhang, J. B.
    APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 2010, 101 (02): : 237 - 241
  • [32] UV spectrum-integral Talbot lithography for amplitude periodic micro-grating fabrication
    Deng, Qian
    Liu, Junbo
    Zhou, Shaolin
    Tang, Yan
    Zhao, Lixin
    Hu, Song
    Chen, Yinghong
    8TH INTERNATIONAL SYMPOSIUM ON ADVANCED OPTICAL MANUFACTURING AND TESTING TECHNOLOGIES: DESIGN, MANUFACTURING, AND TESTING OF MICRO- AND NANO-OPTICAL DEVICES AND SYSTEMS; AND SMART STRUCTURES AND MATERIALS, 2016, 9685
  • [33] APPLICABILITY OF REACTIVE ION ETCHING TO FABRICATION OF MICRO-PRISM-ARRAY FOR DIOPTRICS SYSTEM
    Fujie, Ryuto
    Okada, Akira
    Uno, Yoshiyuki
    PROGRESS OF MACHINING TECHNOLOGY, 2012, : 227 - +
  • [34] Substrate positioning error analysis and compensation method in holographic grating fabrication
    Jiangsu Key Laboratory of Medical Optics, Suzhou Institute of Biomedical Engineering and Technology, Chinese Academy of Sciences, Suzhou
    Jiangsu
    215163, China
    不详
    Jiangsu
    210094, China
    Guangxue Xuebao,
  • [35] Direct fabrication of a diffraction grating onto organic oligomer crystals by focused ion beam lithography followed by plasma etching
    Inada, Yuhi
    Yamashita, Shusuke
    Murakami, Shuya
    Takahashi, Kazuo
    Yamao, Takeshi
    Hotta, Shu
    JAPANESE JOURNAL OF APPLIED PHYSICS, 2021, 60 (12)
  • [36] Fabrication of size-tunable gold nanoparticles array with nanosphere lithography, reactive ion etching, and thermal annealing
    Tan, BJY
    Sow, CH
    Koh, TS
    Chin, KC
    Wee, ATS
    Ong, CK
    JOURNAL OF PHYSICAL CHEMISTRY B, 2005, 109 (22): : 11100 - 11109
  • [37] Efficient and Adaptive Error Recovery in a Micro-Electrode-Dot-Array Digital Microfluidic Biochip
    Li, Zipeng
    Lai, Kelvin Yi-Tse
    McCrone, John
    Yu, Po-Hsien
    Chakrabarty, Krishnendu
    Pajic, Miroslav
    Ho, Tsung-Yi
    Lee, Chen-Yi
    IEEE TRANSACTIONS ON COMPUTER-AIDED DESIGN OF INTEGRATED CIRCUITS AND SYSTEMS, 2018, 37 (03) : 601 - 614
  • [38] Fabrication of Cylindrical Micro-Parts Using Synchronous Rotary Scan-Projection Lithography and Chemical Etching
    Ito, Kaiki
    Suzuki, Yuta
    Horiuchi, Toshiyuki
    PHOTOMASK JAPAN 2017: XXIV SYMPOSIUM ON PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY, 2017, 10454
  • [39] Fabrication of Cylindrical Micro-Parts Using Synchronous Rotary Scan-Projection Lithography and Chemical Etching
    Ito, Kaiki
    Suzuki, Yuta
    Horiuchi, Toshiyuki
    PHOTOMASK TECHNOLOGY 2017, 2017, 10451
  • [40] Fabrication error analysis for diffractive optical elements used in a lithography illumination system
    Wang, Jian
    Zhang, Fang
    Song, Qiang
    Zeng, Aijun
    Zhu, Jing
    Huang, Huijie
    OPTICAL ENGINEERING, 2015, 54 (04)
12345