Fabrication of micro-array of Fresnel rings on Si by electron beam lithography and reactive ion etching

被引：6
|
作者：
Chiromawa, Nura Liman [1 ,2 ]
Ibrahim, Kamarulazizi [1 ]
机构：
[1] Univ Sains Malaysia, Inst Nanooptoelect Res & Technol INOR, Gelugor 11800, Penang, Malaysia
[2] Umaru Musa Yaradua Univ, Dept Phys, PMB 2218, Katsina, Nigeria
来源：
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2016年 / 122卷 / 02期
关键词：
DIELECTRIC SPHEROIDAL PARTICLES; NEAR-FIELD; CHF3/AR;
D O I：
10.1007/s00339-016-9649-y
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Recently, micro-lenses have attracted more attention among optoelectronics device application developers. This paper presents the micro-array of Si-Fresnel rings fabricated by the electron beam lithography and reactive ion etching. Fresnel rings units containing 11 concentric rings were created on the PMMA layer with the outermost Fresnel ring, having an external diameter of 45.24 mu m, and are located approximate to 200 mu m away from each other. These structures can be copied as the micro-array of Fresnel lenses for optoelectronics device applications.
引用
收藏
页码：1 / 8
页数：8
相关论文
共 50 条
  • [1] Fabrication of micro-array of Fresnel rings on Si by electron beam lithography and reactive ion etching
    Nura Liman Chiromawa
    Kamarulazizi Ibrahim
    [J]. Applied Physics A, 2016, 122
  • [2] 20 nm electron beam lithography and reactive ion etching for the fabrication of double gate FinFET devices
    Kretz, J
    Dreeskornfeld, L
    Hartwich, J
    Rösner, W
    [J]. MICROELECTRONIC ENGINEERING, 2003, 67-8 : 763 - 768
  • [3] Fabrication of metal nanoring array by nanoimprint lithography (NIL) and reactive ion etching
    Cui, Bo
    Veres, Teodor
    [J]. MICROELECTRONIC ENGINEERING, 2007, 84 (5-8) : 1544 - 1547
  • [4] 10 NM SI PILLARS FABRICATED USING ELECTRON-BEAM LITHOGRAPHY, REACTIVE ION ETCHING, AND HF ETCHING
    FISCHER, PB
    DAI, K
    CHEN, E
    CHOU, SY
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1993, 11 (06): : 2524 - 2527
  • [5] Fabrication of silicon nanopillar arrays by electron beam lithography and reactive ion etching for advanced bacterial adhesion studies
    Doll, P. W.
    Al-Ahmad, A.
    Bacher, A.
    Muslija, A.
    Thelen, R.
    Hahn, L.
    Ahrens, R.
    Spindler, B.
    Guber, A. E.
    [J]. MATERIALS RESEARCH EXPRESS, 2019, 6 (06):
  • [6] Silicon Nanohole Arrays Fabricated by Electron Beam Lithography and Reactive Ion Etching
    Rahmasari, Lita
    Abdullah, Mohd Faizol
    Zain, Ahmad Rifqi Md
    Hashim, Abdul Manaf
    [J]. SAINS MALAYSIANA, 2019, 48 (06): : 1157 - 1161
  • [7] MEMS FABRICATION BY LITHOGRAPHY AND REACTIVE ION ETCHING (LIRIE)
    RANGELOW, IW
    HUDEK, P
    [J]. MICROELECTRONIC ENGINEERING, 1995, 27 (1-4) : 471 - 474
  • [8] Fabrication of Si microstructures using focused ion beam implantation and reactive ion etching
    Qian, H. X.
    Zhou, Wei
    Miao, Jianmin
    Lim, Lennie E. N.
    Zeng, X. R.
    [J]. JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2008, 18 (03)
  • [9] FABRICATION OF AN OPTICAL DIRECTIONAL COUPLER OF CDTE BY ELECTRON-BEAM LITHOGRAPHY AND ION ETCHING
    NISHIMURA, T
    ARITOME, H
    NAMBA, S
    [J]. IEEE JOURNAL OF QUANTUM ELECTRONICS, 1980, 16 (12) : 1337 - 1340
  • [10] Electron beam lithography and reactive ion etching of nanometer size features in niobium films
    Piotrowski, TT
    Piotrowska, A
    Kaminska, E
    Szopniewski, Z
    Kolesnik, S
    Wróbel, J
    Gierlowski, P
    Lewandowski, S
    [J]. MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2001, 15 (1-2): : 171 - 173
12345