Control of ozonated water cleaning process for photoresist removal

被引：4

作者：

Lim, SW ^{[1
]}

Chidsey, CED

机构：

[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA

[2] Stanford Univ, Dept Chem, Stanford, CA 94305 USA

来源：

ULTRA CLEAN PROCESSING OF SILICON SURFACES 2000 | 2001年 / 76-77卷

关键词：

ozone decomposition; photoresist removal; process optimization;

D O I：

10.4028/www.scientific.net/SSP.76-77.215

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

下载

页码：215 / 218

页数：4

共 50 条

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