Control of ozonated water cleaning process for photoresist removal

被引：4
|
作者：
Lim, SW [1 ]
Chidsey, CED
机构：
[1] Stanford Univ, Dept Elect Engn, Stanford, CA 94305 USA
[2] Stanford Univ, Dept Chem, Stanford, CA 94305 USA
来源：
ULTRA CLEAN PROCESSING OF SILICON SURFACES 2000 | 2001年 / 76-77卷
关键词：
ozone decomposition; photoresist removal; process optimization;
D O I：
10.4028/www.scientific.net/SSP.76-77.215
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
下载
收藏
页码：215 / 218
页数：4
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