Preparation of dense carbon nanotube film using microwave plasma-enhanced chemical vapor deposition

被引:12
|
作者
Taniguchi, M
Nagao, H
Hiramatsu, M
Ando, Y
Hori, M
机构
[1] Meijo Univ, Dept Elect & Elect Engn, Nano Factory, Tempaku Ku, Nagoya, Aichi 4688502, Japan
[2] Meijo Univ, Dept Mat Sci & Engn, Nano Factory, Tempaku Ku, Nagoya, Aichi 4688502, Japan
[3] Nagoya Univ, Dept Elect Engn & Comp Sci, Chikusa Ku, Nagoya, Aichi 4648603, Japan
关键词
nanotubes; plasma CVD; catalytic processes; high resolution electron microscopy;
D O I
10.1016/j.diamond.2004.10.002
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Dense, vertically aligned carbon nanotube (CNT) films were rapidly grown using microwave plasma-enhanced chemical vapor deposition (PCVD). Catalytic cobalt (Co) nanoparticles were prepared on the substrate using excimer laser ablation method. No heat pre-treatment was performed for the catalyst prior to the CNT growth. At the initial growth stage, the CNTs grew at an extremely high rate of 300 nm/s. The average outer diameter of the nanotubes was approximately 6 nm. The CNTs were characterized by their relatively large inner diameter (ca. 4 nm) and thinner wall thickness (2-5 concentric layers). (c) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:855 / 858
页数:4
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