Growth of carbon nanotubes using microwave plasma-enhanced chemical vapor deposition process

被引:8
|
作者
Liu, RM [1 ]
Ting, JM [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Mat Sci & Engn, Tainan 70101, Taiwan
关键词
carbon nanotubes; CVD; microwave; catalyst;
D O I
10.1016/S0254-0584(03)00314-6
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Carbon nanotubes were grown on Si substrates using a plasma enhanced chemical vapor deposition technique under various gaseous compositions, microwave powers, and pressures. An iron-containing compound was used as the catalyst. The hydrocarbon used was methane. The resulting carbon nanotubes were examined using scanning electron microscopy and transmission electron microscopy. The diameters of carbon nanotubes (CNTs) were found to be dominated by methane concentration and plasma power. It was also found that the catalyst particles were deformed during the growth of CNTs which led to a sheath growth mechanism. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:571 / 574
页数:4
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