Influence of Power Pulse Parameters on the Microstructure and Properties of the AlCrN Coatings by a Modulated Pulsed Power Magnetron Sputtering

被引:12
|
作者
Zheng, Jun [1 ]
Zhou, Hui [1 ]
Gui, Binhua [1 ]
Luo, Quanshun [2 ]
Li, Haixu [3 ]
Wang, Qimin [3 ]
机构
[1] Lanzhou Inst Phys, Sci & Technol Vacuum Technol & Phys Lab, Lanzhou 730000, Gansu, Peoples R China
[2] Sheffield Hallam Univ, Mat & Engn Res Inst, Sheffield S1 1WB, S Yorkshire, England
[3] Guangdong Univ Technol, Sch Electromech Engn, Guangzhou 510006, Guangdong, Peoples R China
来源
COATINGS | 2017年 / 7卷 / 12期
关键词
modulated pulsed power magnetron sputtering; power pulse parameter; AlCrN coating; microstructure; tribological behavior; MECHANICAL-PROPERTIES; OXIDATION BEHAVIOR; HIGH-TEMPERATURE; THIN-FILMS; PERFORMANCE; RESISTANCE; FREQUENCY; ALTIN; CRN;
D O I
10.3390/coatings7120216
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
In this study, AlCrN coatings were deposited using modulated pulsed power magnetron sputtering (MPPMS) with different power pulse parameters by varying modulated pulsed power (MPP) charge voltages (350 to 550 V). The influence of power pulse parameters on the microstructure, mechanical properties and thermal stability of the coatings was investigated. The results indicated that all the AlCrN coatings exhibited a dense columnar microstructure. Higher charge voltage could facilitate a denser coating microstructure. As the charge voltage increased up to 450 V or higher, the microvoids along the column boundaries disappeared and the coatings became fully dense. The main phase in the AlCrN coatings was the c-(Al, Cr) N solid solution phase with NaCl-type phase structure. A diffraction peak of the h-AlN phase was detected at a 2 theta of around 33 degrees, when the charge voltage was higher than 500 V. The hardness of the AlCrN coatings varied as a function of charge voltage. The maximum value of the hardness (30.8 GPa) was obtained at 450 V. All the coatings showed good thermal stability and maintained their structure and mechanical properties unchanged up to 800 degrees C during vacuum annealing. However, further increasing the annealing temperature to 1000 degrees C resulted in apparent change in the microstructure and decrease in the hardness. The charge voltages also showed a significant influence on the high-temperature tribological behavior of the coatings. The coating deposited at the charge voltage of 550 V exhibited excellent tribological properties with a low friction coefficient.
引用
收藏
页数:16
相关论文
共 50 条
  • [41] Effects of the magnetic field strength on the modulated pulsed power magnetron sputtering of metallic films
    Lin, Jianliang
    Moore, John J.
    Sproul, William D.
    Lee, S. L.
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2011, 29 (06):
  • [42] Time-resolved plasma characterisation of modulated pulsed power magnetron sputtering of chromium
    Liebig, B.
    Braithwaite, N. St J.
    Kelly, P. J.
    Chistyakov, R.
    Abraham, B.
    Bradley, J. W.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2011, 205 : S312 - S316
  • [43] Effect of N2 Flow Rate of Dual-Stage High Power Pulsed Magnetron Sputtering on the Microstructure and Properties of TiN Coatings
    Hao Juan
    Yang Chao
    Ding Yuhang
    Zhang Jing
    Wang Xu
    Du Yuzhou
    Ma Li
    Jiang Bailing
    [J]. RARE METAL MATERIALS AND ENGINEERING, 2022, 51 (11) : 4109 - 4116
  • [44] Effect of N2 Flow Rate of Dual-Stage High Power Pulsed Magnetron Sputtering on the Microstructure and Properties of TiN Coatings
    Hao, Juan
    Yang, Chao
    Ding, Yuhang
    Zhang, Jing
    Wang, Xu
    Du, Yuzhou
    Ma, Li
    Jiang, Bailing
    [J]. Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering, 2022, 51 (11): : 4109 - 4116
  • [45] Influence of Ar/Kr ratio and pulse parameters in a Cr-N high power pulse magnetron sputtering process on plasma and coating properties
    Bobzin, Kirsten
    Bagcivan, Nazlim
    Theiss, Sebastian
    Trieschmann, Jan
    Brugnara, Ricardo Henrique
    Preissing, Sven
    Hecimovic, Ante
    [J]. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (02):
  • [46] Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering
    Lin, J.
    Moore, J. J.
    Sproul, W. D.
    Mishra, B.
    Rees, J. A.
    Wu, Z.
    Chistyakov, R.
    Abraham, B.
    [J]. SURFACE & COATINGS TECHNOLOGY, 2009, 203 (24): : 3676 - 3685
  • [47] Development of cluster ion source based on modulated pulse power magnetron sputtering technique
    Zhang, C. H.
    Tsunoyama, H.
    Akatsuka, H.
    Sekiya, H.
    Nagase, T.
    Nakajima, A.
    [J]. 2013 8TH ANNUAL IEEE INTERNATIONAL CONFERENCE ON NANO/MICRO ENGINEERED AND MOLECULAR SYSTEMS (IEEE NEMS 2013), 2013, : 428 - 431
  • [48] Erosion Performance of TiAlSiN Coatings Prepared by High-Power Pulsed Magnetron Sputtering
    Li, Hua
    Li, Liuhe
    Li, Duoduo
    Tang, Ling
    Luo, Yang
    Li, Guang
    Wu, Yuehan
    Li, Guodong
    Xu, Yi
    Han, Mingyue
    Gu, Jiabin
    Huang, Kai
    Feng, Pengbo
    Xu, Xiaolei
    [J]. METALS, 2023, 13 (07)
  • [49] Influence of Annealing Temperature on the Microstructure and Hardness of TiN Coatings Deposited by High-Power Impulse Magnetron Sputtering
    Anas Ghailane
    El Yazid Maadane
    Ayyoube Barchid
    Sabah Berchane
    Soukayna Badre-Eddine
    Hicham Larhlimi
    Christian B. Fischer
    Jones Alami
    Mohammed Makha
    [J]. Journal of Materials Engineering and Performance, 2022, 31 : 5593 - 5601
  • [50] Investigation of the influence of the parameters of a pulsed power source on the properties of a magnetron's high-power gas discharge
    Borzykin, T. S.
    Karzin, V. V.
    Ivanov, D. A.
    Lullin, Z. G.
    Reznikov, R., I
    [J]. 26TH INTERNATIONAL CONFERENCE ON VACUUM TECHNIQUE AND TECHNOLOGY, 2019, 1313